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Dr. Alex Wei
at Siemens EDA
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Author
Publications (1)
Proceedings Article | 13 November 2024 Presentation
Co-optimization of photomask exposure conditions and MPC
Michael Erickson, Mahesh Chandramouli, Alex Johnson, Michael Mroz, Vlad Liubich, Zach Rice, Arvind Sundaramurthy, Kushlendra Mishra, Rachit Sharma, Ingo Bork, Alex Wei, Jörg Mellmann, Jiechang Hou
Proceedings Volume 13216, 132161S (2024) https://doi.org/10.1117/12.3038102
KEYWORDS: Photomasks, Critical dimension metrology, SRAF, Scattering, Printing, Bias correction, Forward error correction, Extreme ultraviolet, Modulation, Etching
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