We present performance metrics for the commercially available TEUS product line. TEUS-S is a high-brightness EUV LPP light source based on a fast rotating liquid metal target with EUV collection angle of 0.05sr. The TEUS-S100 and S400 models employing 100W and 400W of average laser power respectively have been characterized wi0th particular attention to the collector optics lifetime. It is estimated that 10% mirror reflectivity degradation will occur after 2 years for the TEUS-S100 and after 0.5 year for the TEUS-S400 in 24/7operation mode.
The TEUS-S400 source provides more than 30 mW of in-band (±1%) EUV radiation after the debris mitigation system.
The progress of EUVL and the introduction of HVM scanners demands advanced actinic metrology especially for the EUV mask supply chain. For stand alone field use reliable metrology sources for EUV inband emission around 13.5 nm are critically needed. For nanometer resolution the effective “inband brightness” is extremely important. Laser produced EUV sources (LPP) are cost effective with efficient energy use thus providing a reliable approach for real-life industrial applications. However, apart from the Cymer/ASML LPP scanner source no such source is available. One reason is that realizing a reliable tin droplet target is beyond the technical and financial scope of a metrology source. In this paper, we propose a path to make industrial laser produced plasma based EUV sources reliable and with easy renewable targets a reality.
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