Dr. Alexandre Lagrange Profile

Dr. Alexandre Lagrange

at CEA-LETI

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 5 March 2021 Presentation + Paper

Ultra-high speed optical wireless communications with gallium-nitride microLED

Luc Maret, Alexandre Lagrange, Ludovic Dupré

Proceedings Volume 11706, 117060O (2021) https://doi.org/10.1117/12.2576092

KEYWORDS: Wireless communications, Modulation, Wafer-level optics, Transmitters, Semiconducting wafers, Sapphire, Orthogonal frequency division multiplexing, Optical components, Optical alignment, Modeling

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Proceedings Article | 8 March 2016 Paper

Monolithic LED arrays, next generation smart lighting sources

Alexandre Lagrange, Hubert Bono, François Templier

Proceedings Volume 9768, 97680X (2016) https://doi.org/10.1117/12.2209574

KEYWORDS: Light emitting diodes, LED lighting, Light sources and illumination, Light sources, Electronics, Gallium nitride, Light, Head, Lamps, Silicon

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Proceedings Article | 25 September 2014 Paper

Complete solid state lighting (SSL) line at CEA LETI

I. Robin, P. Ferret, A. Dussaigne, C. Bougerol, D. Salomon, X. Chen, M. Charles, P. Tchoulfian, A. Gasse, A. Lagrange, M. Consonni, H. Bono, F. Levy, Y. Desieres, A. Aitmani, S. Makram-Matta, E. Bialic, P. Gorrochategui, L. Mendizabal

Proceedings Volume 9190, 91900I (2014) https://doi.org/10.1117/12.2060514

KEYWORDS: Light emitting diodes, Gallium nitride, Solid state lighting, Silicon, Light sources and illumination, Semiconducting wafers, Quantum wells, LED lighting, Quantum efficiency, Packaging

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Proceedings Article | 21 March 2008 Paper

Design requirements for a stand alone EUV interferometer

Ph. Michallon, C. Constancias, A. Lagrange, B. Dalzotto

Proceedings Volume 6921, 69213Y (2008) https://doi.org/10.1117/12.771586

KEYWORDS: Extreme ultraviolet, Interferometers, Lithography, Optical design, Extreme ultraviolet lithography, Line edge roughness, Photomasks, Synchrotrons, Light sources, Collimation

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Proceedings Article | 7 March 2008 Paper

Contrast management of 193i interferometry to be close to scanners contrast conditions

Alexandre Lagrange, Philippe Bandelier, Christelle Charpin, Olivier Lartigue

Proceedings Volume 6924, 69242G (2008) https://doi.org/10.1117/12.772584

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Interferometers, Scanners, Interferometry, Lithography, Image processing, Photoresist materials, Modulation, Semiconducting wafers

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Proceedings Article | 21 March 2006 Paper

Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast

Alex Lagrange, Anne Laure Charley, Olivier Lartigue, Marianne Derouard

Proceedings Volume 6154, 61544O (2006) https://doi.org/10.1117/12.652227

KEYWORDS: Interferometers, Immersion lithography, Lithography, Statistical modeling, Computer simulations, Interferometry, Semiconducting wafers, Vibrometry, Photoresist materials, Diffraction gratings

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Proceedings Article | 21 March 2006 Paper

Liquid immersion lithography at 193 nm using a high-NA achromatic interferometer

Anne-Laure Charley, Alexandre Lagrange, Olivier Lartigue, Philippe Bandelier, Marianne Derouard, Patrick Schiavone

Proceedings Volume 6154, 61541Z (2006) https://doi.org/10.1117/12.654404

KEYWORDS: Polarization, Interferometers, Line edge roughness, Line width roughness, Diffraction gratings, Diffraction, Interferometry, Printing, Photoresist materials, Liquids

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Proceedings Article | 7 April 1999 Paper

Automatic YAG damage test benches: additional possibilities

Jean Hue, Jean Dijon, Guillaume Ravel, Philippe Lyan, Pierre Garrec, T. Lanternier, Michel Olivier, Alexandre Lagrange

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344399

KEYWORDS: Laser induced damage, Laser damage threshold, Light scattering, YAG lasers, Diagnostics, Camera shutters, Silicon, Raster graphics, Laser sources, Mirrors

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Showing 5 of 8 publications

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