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Alice Pelletier
at STMicroelectronics SA
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Author
Publications (5)
Proceedings Article | 27 April 2023 Poster + Paper
Optimizations of APC multivariate algorithm for linear mix and match overlay control
Proceedings Volume 12496, 1249627 (2023) https://doi.org/10.1117/12.2655762
KEYWORDS: Scanners, Advanced process control, Mathematical optimization, Overlay metrology, Feedback loops, Process modeling, Lithography
Proceedings Article | 24 March 2016 Paper
Resist 3D model based OPC for 28nm metal process window enlargement
P. Fanton, J. C. Le Denmat, C. Gardiola, A. Pelletier, F. Foussadier, C. Gardin, J. Planchot, A. Szucs, O. Ndiaye, N. Martin, L. Depre, F. Robert
Proceedings Volume 9778, 97781U (2016) https://doi.org/10.1117/12.2218916
KEYWORDS: 3D modeling, Optical proximity correction, Metals, 3D metrology, Optical lithography, Evolutionary algorithms, Photomasks, Scanning electron microscopy, Critical dimension metrology, Image processing, Etching, Calibration, Artificial intelligence, Reliability
SPIE Journal Paper | 10 April 2015
Patterning critical dimension control for advanced logic nodes
Bertrand Le-Gratiet, Jean De-Caunes, Maxime Gatefait, Auguste Lam, Alain Ostrovsky, Jonathan Planchot, Vincent Farys, Julien Ducoté, Marc Mikolajczak, Vincent Morin, Nicolas Chojnowski, Frank Sundermann, Alice Pelletier, Regis Bouyssou, Cedric Monget, Jean-Damien Chapon, Bastien Orlando, Laurene Babaud, Céline Lapeyre, Emek Yesilada, Anna Szucs, Jean-Christophe Michel, Latifa Desvoivres, Onintza Ros Bengoechea, Pascal Gouraud
JM3, Vol. 14, Issue 02, 021103, (April 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.021103
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction
Proceedings Article | 17 October 2014 Paper
How holistic process control translates into high mix logic fab APC?
Proceedings Volume 9231, 92310V (2014) https://doi.org/10.1117/12.2064795
KEYWORDS: Semiconducting wafers, Photomasks, Process control, Scanners, Metrology, Etching, Databases, Logic, Data modeling, Control systems
Proceedings Article | 5 April 2012 Paper
Integration and automation of DoseMapper in a logic fab APC system: application for 45/40/28nm node
Bertrand Le Gratiet, Christophe Salagnon, Jean de Caunes, Marc Mikolajczak, Vincent Morin, Nicolas Chojnowski, Frank Sundermann, Jean Massin, Alice Pelletier, Joel Metz, Yoann Blancquaert, Regis Bouyssou, Arthur Pelissier, Olivier Belmont, Anne Strapazzon, Anna Phillips, Thierry Devoivre, Emilie Bernard, Estelle Batail, Lionel Thevenon, Benedicte Bry, Fabrice Bernard-Granger, Ahmed Oumina, Marie-Pierre Baron, Didier Gueze
Proceedings Volume 8324, 83241Y (2012) https://doi.org/10.1117/12.911882
KEYWORDS: Etching, Photomasks, Logic, Databases, Control systems, Scanners, Metrology, Semiconducting wafers, Lithography, Process control
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