Ms. Amy Kwok Profile

Amy Kwok

at DuPont Electronics & Industrial

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Author

Publications (9)

Proceedings Article | 9 April 2024 Paper

Disruptive non-fluorinated photoacid generators using computational chemistry and library design

P. LaBeaume, K. Hernandez, E. Vitaku, T. Marangoni, E. Aqad, M. Li, C. Hoelzel, J. Lachowski, M. Hayes, S. Wong, J. Li, A. Kwok, W. Huang, J. Park, H. He, H. Mackay, C. Liu, J. Cameron, C. Xu, Q. Xie, K. Petrillo

Proceedings Volume 12957, 129572B (2024) https://doi.org/10.1117/12.3025297

KEYWORDS: Photoacid generators, Photoresist materials, Semiconducting wafers, Design, Lithography, Optical lithography, Coating thickness, Chemistry, Coating, Silicon, Sustainability, Extreme ultraviolet lithography

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

High contact angle embedded barrier layer materials for next-generation 193 immersion lithography

Joshua Kaitz, Mingqi Li, Ryan Lee, Amy Kwok, Thomas Cardolaccia, Amiel Evans, Choong-Bong Lee, Xisen Hou, Ke Yang

Proceedings Volume 11612, 116120U (2021) https://doi.org/10.1117/12.2583735

KEYWORDS: Polymers, Semiconducting wafers, Lithography, Water, Photoresist materials, Immersion lithography, Coating, 193nm lithography, Surface properties, Semiconductor manufacturing, Polymer chemistry

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Proceedings Article | 25 March 2019 Paper

Contact hole shrink of 193nm NTD immersion resist

Joshua Kaitz, Janet Wu, Vipul Jain, Iou-Sheng Ke, Mingqi Li, Amy Kwok, James Park, Jong Park, Jin Wuk Sung, Cong Liu

Proceedings Volume 10960, 1096022 (2019) https://doi.org/10.1117/12.2518366

KEYWORDS: Polymers, Chemistry, Optical lithography, Lithography, Semiconducting wafers, Scanning electron microscopy, Electronics, Extreme ultraviolet lithography

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Proceedings Article | 1 April 2013 Paper

Effect of leaving group design on EUV lithography performance

Owendi Ongayi, Vipul Jain, Suzanne Coley, David Valeri, Amy Kwok, Dung Quach, Mike Wagner, Jim Cameron, Jim Thackeray

Proceedings Volume 8679, 867907 (2013) https://doi.org/10.1117/12.2011600

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Radiation effects, Lithography, Neodymium, Silicon, Spectroscopy, Polymer thin films

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Proceedings Article | 23 March 2012 Paper

Comparison of EUV and e-beam lithographic technologies for sub-22-nm node patterning

James Cameron, Jim Thackeray, Jin Wuk Sung, Suzanne Coley, Vipul Jain, Owendi Ongayi, Mike Wagner, Paul LaBeaume, Amy Kwok, David Valeri, Marie Hellion, Béatrice Icard, Bernard Dal'zotto, Claire Sourd, Laurent Pain

Proceedings Volume 8322, 83222F (2012) https://doi.org/10.1117/12.916598

KEYWORDS: Extreme ultraviolet, Electron beam lithography, Extreme ultraviolet lithography, Lithography, Polymers, Semiconductors, Line width roughness, Maskless lithography, Photomasks, EUV optics

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Proceedings Article | 23 March 2012 Paper

High sensitivity chemically amplified EUV resists through enhanced EUV absorption

Owendi Ongayi, Matthew Christianson, Matthew Meyer, Suzanne Coley, David Valeri, Amy Kwok, Mike Wagner, Jim Cameron, Jim Thackeray

Proceedings Volume 8322, 83220T (2012) https://doi.org/10.1117/12.916482

KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Line width roughness, Extreme ultraviolet lithography, Polymer thin films, Chromophores, Electrons, Molecules, Photoresist materials

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Proceedings Article | 7 April 2011 Paper

Impact of polymerization process on OOB on lithographic performance of a EUV resist

Vipul Jain, Suzanne Coley, Jung June Lee, Matthew Christianson, Daniel Arriola, Paul LaBeaume, Maria Danis, Nicolas Ortiz, Su-Jin Kang, Michael Wagner, Amy Kwok, David Valeri, James Thackeray

Proceedings Volume 7969, 796912 (2011) https://doi.org/10.1117/12.879487

KEYWORDS: Polymers, Polymerization, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Lithography, Spectroscopy, Radiation effects, Photoresist processing, Electronic support measures

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Proceedings Article | 10 April 2009 Paper

Reflection control for immersion lithography: a single organic antireflectant over high-reflective substrates for double patterning

Sabrina Wong, Jeong Yun Yu, Sue Ryeon Kim, Mike Mori, Amy Kwok, Kathleen O'Connell, George Barclay, Ki Lyoung Lee, Sung Koo Lee, Cheol Kyu Bok

Proceedings Volume 7273, 727318 (2009) https://doi.org/10.1117/12.816448

KEYWORDS: Reflectivity, Double patterning technology, Immersion lithography, Multilayers, Silicon, Interfaces, Optical lithography, Lithography, Etching, Control systems

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Proceedings Article | 24 August 2001 Paper

Planarizing ARs for dual-damascene processing

Edward Pavelchek, Marjorie Cernigliaro, Peter Trefonas, Amy Kwok, Suzanne Coley

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436920

KEYWORDS: Semiconducting wafers, Etching, Dielectrics, Oxides, Coating, Error analysis, Argon, Prototyping, Thin film coatings, Lithography

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Showing 5 of 9 publications

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