Dr. Kas Andrle Profile

Dr. Kas Andrle

at Lawrence Berkeley National Lab

SPIE Involvement:

Author

Publications (8)

SPIE Journal Paper | 18 October 2024 Open Access

Characterization of latent image of electron beam resist via critical-dimension resonant soft X-ray scattering

Qi Zhang, Kas Andrle, Weilun Chao, Zhengxing Peng, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar, Alexander Hexemer, Patrick Naulleau, Bruno La Fontaine, Ricardo Ruiz, Cheng Wang

JM3, Vol. 23, Issue 04, 044003, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.044003

KEYWORDS: Scattering, X-rays, X-ray imaging, Stochastic processes, Atomic force microscopy, Extreme ultraviolet lithography, Electron beams, Simulations, Laser scattering, Finite element methods

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Proceedings Article | 27 April 2023 Presentation + Paper

Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques

Philipp Hönicke, Yves Kayser, Victor Soltwisch, Andre Wählisch, Nils Wauschkuhn, Jeroen Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, Burkhard Beckhoff

Proceedings Volume 12496, 124961J (2023) https://doi.org/10.1117/12.2657963

KEYWORDS: Nanostructures, X-ray fluorescence spectroscopy, Metrology, Semiconductors, Fluorescence intensity, Data modeling, Transmission electron microscopy, Small targets

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Proceedings Article | 1 December 2022 Paper

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

Qais Saadeh, Hazem Mesilhy, Victor Soltwisch, Andreas Erdmann, Richard Ciesielski, Leonhard Lohr, Anna Andrle, Vicky Philipsen, Devesh Thakare, Christian Laubis, Frank Scholze, Michael Kolbe

Proceedings Volume 12293, 122930Y (2022) https://doi.org/10.1117/12.2643246

KEYWORDS: Extreme ultraviolet, Scatterometry, Photomasks, Refractive index, Scattering, Reflectivity, Metrology, Databases, Oxidation, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet coatings, Modeling and simulation, Optical constants, Optical metrology

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Proceedings Article | 1 November 2022 Paper

High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

V. Soltwisch, S. Glabisch, A. Andrle, V. Philipsen, Q. Saadeh, S. Schröder, L. Lohr, R. Ciesielski, S. Brose

Proceedings Volume 12472, 124720Q (2022) https://doi.org/10.1117/12.2640176

KEYWORDS: Extreme ultraviolet, Scatterometry, Diffraction, Reflectivity, X-rays, Photomasks, Reflectometry, Scattering, Ruthenium, Optical components

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Proceedings Article | 21 June 2021 Presentation + Paper

Identifying the type of line edge roughness using grazing-incidence x-ray fluorescence

Zanyar Salami, Analía Fernández Herrero, Anna Andrle, Philipp Hönicke, Victor Soltwisch

Proceedings Volume 11783, 1178307 (2021) https://doi.org/10.1117/12.2592611

KEYWORDS: Line edge roughness, Line width roughness, Nanostructures, X-ray fluorescence spectroscopy, X-rays, Oxides, Scatterometry, Grazing incidence, Finite element methods

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Proceedings Article | 22 February 2021 Presentation

GIXRF and machine learning as metrological tools for shape and element sensitive reconstructions of periodic nanostructures

Anna Andrle, Philipp Hönicke, Grzegorz Gwalt, Philipp-Immanuel Schneider, Yves Kayser, Frank Siewert, Victor Soltwisch

Proceedings Volume 11611, 116110R (2021) https://doi.org/10.1117/12.2586082

KEYWORDS: Nanostructures, Metrology, Machine learning, X-rays, X-ray optics, X-ray fluorescence spectroscopy, Statistical analysis, Semiconducting wafers, Reflectivity, Nondestructive evaluation

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Proceedings Article | 21 June 2019 Presentation + Paper

Grazing incidence x-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction

Anna Andrle, Philipp Hönicke, Philipp Schneider, Yves Kayser, Martin Hammerschmidt, Sven Burger, Frank Scholze, Burkhard Beckhoff, Victor Soltwisch

Proceedings Volume 11057, 110570M (2019) https://doi.org/10.1117/12.2526082

KEYWORDS: Luminescence, Nanostructures, Particle swarm optimization, Silicon, Optimization (mathematics), X-rays, X-ray fluorescence spectroscopy, Finite element methods, Oxides, Sensors

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Proceedings Article | 14 March 2018 Presentation

From heterostructure design to package: development of efficient and reliable UVB LEDs (Conference Presentation)

Neysha Lobo Ploch, Tim Kolbe, Arne Knauer, Jens Rass, Hyun Kyong Cho, Johannes Glaab, Jan Ruschel, Anna Andrle, Sylvia Hagedorn, Katrin Hilbrich, Christoph Stoelmacker, Steffen Knigge, Maria Reiner, Ina Ostermay, Andreas Thies, Deepak Prasai, Olaf Krueger, Sven Einfeldt, Markus Weyers, Michael Kneissl

Proceedings Volume 10532, 1053220 (2018) https://doi.org/10.1117/12.2287131

KEYWORDS: Light emitting diodes, Heterojunctions, Electron beam lithography, Ultraviolet radiation, Packaging, Ultraviolet light emitting diodes, Mercury, Lamps, Phototherapy, Vapor phase epitaxy

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Showing 5 of 8 publications

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