Mr. Aritoshi Sugimoto Profile

Aritoshi Sugimoto

Technical Adviser

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 24 March 2006 Paper

From speculation to specification: a discussion on how to define the tolerance of LER/LWR and its measurement methodology

Atsuko Yamaguchi, Robert Steffen, Hiroki Kawada, Takashi Iizumi, Aritoshi Sugimoto

Proceedings Volume 6152, 61524O (2006) https://doi.org/10.1117/12.656055

KEYWORDS: Line width roughness, Transistors, Line edge roughness, Tolerancing, Metrology, Field effect transistors, Materials processing, Interference (communication), Scanning electron microscopy, Critical dimension scanning electron microscopy

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SPIE Journal Paper | 1 October 2005

High-energy scanning electron microscope for the observation of subsurface structures

Miyako Matsui, Syuntaro Machida, Hideo Todokoro, Tadashi Otaka, Aritoshi Sugimoto

JM3, Vol. 4, Issue 04, 043007, (October 2005) https://doi.org/10.1117/12.10.1117/1.2073767

KEYWORDS: Scanning electron microscopy, Electron microscopes, Spatial resolution, Electron beams, Semiconducting wafers, Monte Carlo methods, 3D metrology, Silicon, Metrology, Particles

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Proceedings Article | 10 May 2005 Paper

Observation of subsurface structures using high-energy SEM

Miyako Matsui, Syuntaro Machida, Hideo Todokoro, Tadashi Otaka, Aritoshi Sugimoto

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.597269

KEYWORDS: Scanning electron microscopy, Electrons, Spatial resolution, Monte Carlo methods, 3D metrology, Control systems, Semiconducting wafers, Manufacturing, Metrology, Optical inspection

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Proceedings Article | 15 July 2003 Paper

In-line e-beam inspection with optimized sampling and newly developed ADC

Masami Ikota, Akihiro Miura, Munenori Fukunishi, Takashi Hiroi, Aritoshi Sugimoto

Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.485225

KEYWORDS: Inspection, Particles, Defect inspection, Defect detection, Optical inspection, Semiconducting wafers, Image classification, Manufacturing, Electron beams, Product engineering

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Proceedings Article | 14 June 1999 Paper

Defect inspection on CMP process and its application

Minori Noguchi, Yoshimasa Oshima, Hidetoshi Nishiyama, Kenji Watanabe, Aritoshi Sugimoto

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350865

KEYWORDS: Particles, Inspection, Chemical mechanical planarization, Spatial filters, Silicon, Defect inspection, Sensors, Collimation, Imaging systems, Oxides

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Proceedings Article | 14 June 1999 Paper

New patterned wafer inspection system with the function to classify fatal defects

Masami Ikota, Aritoshi Sugimoto, Yuko Inoue, Hisato Nakamura

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350838

KEYWORDS: Wafer inspection, Chemical mechanical planarization, Inspection, Defect inspection, Defect detection, Particles, Spatial filters, Wafer-level optics, Inspection equipment, Signal detection

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Proceedings Article | 8 June 1998 Paper

New particle-inspection system for CMP-planarization-processed metal layers

Masami Ikota, Aritoshi Sugimoto, Yuko Inoue, Junichi Taguchi, Tetsuya Watanabe

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308742

KEYWORDS: Particles, Chemical mechanical planarization, Inspection, Metals, Particle systems, Laser scattering, Image processing, Control systems, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 8 June 1998 Paper

Advanced surface inspection techniques for SOI wafers

Mari Nozoe, Aritoshi Sugimoto, Takahide Ikeda

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308756

KEYWORDS: Semiconducting wafers, Particles, Inspection, Interference (communication), Surface roughness, Wafer inspection, Thin films, Light scattering, Silicon, Oxygen

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Proceedings Article | 1 June 1992 Paper

New process technology for CD control in deep-submicron optical lithography

Aritoshi Sugimoto, Osamu Suga, Kazuyuki Suko, Hitoshi Arakawa

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130317

KEYWORDS: Photoresist processing, Critical dimension metrology, Semiconducting wafers, Optical lithography, Reflection, Image processing, Optical alignment, Refractive index, Water, Interfaces

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Proceedings Article | 1 June 1990 Paper

New indexes of the 0.5-um resolution resist for optical lithography

Aritoshi Sugimoto, Tetsuo Ito, Sadao Okano, Masahiro Nozaki, Takeshi Kato, Kazuyuki Suko, Masayasu Tsunematsu, Kazuya Kadota

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20218

KEYWORDS: Photoresist materials, Optical lithography, Cadmium, Chlorine, Photoresist processing, Photoresist developing, Optical resolution, Quartz, Glasses, Photomasks

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Showing 5 of 10 publications

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