Dr. Arno J. van Leest Profile

Dr. Arno J. van Leest

Principal Engineer at ASML

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Author

Publications (7)

Proceedings Article | 10 April 2024 Poster + Paper

Multi-wavelength continuous-bias DBO metrology for improved ADI process-robustness

Jungmin Lee, Inbeom Lim, Byeong Seon Park, Changyeon Lee, Mincheol Kwak, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Jay Mummery, Bruno Gregorio Almeida, Han-Gyeol Park, Mi-Yeon Baek, Kemal Dahha, Ki-Youn Lee, Se-Hui Lee, Arno van Leest, Thao Nguyen, Marc Noot, Stefan Smith-Meerman, Koen van Witteveen, Jong-Hyuk Yim, Olger Zwier

Proceedings Volume 12955, 129553P (2024) https://doi.org/10.1117/12.3012950

KEYWORDS: Overlay metrology, Signal to noise ratio, Denoising, Semiconducting wafers, Metrology, Inspection, Phase shifts, Optical gratings, Industrial applications, Diffraction

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Proceedings Article | 27 April 2023 Presentation + Paper

Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements

Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest, Simon Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren

Proceedings Volume 12496, 124960H (2023) https://doi.org/10.1117/12.2658330

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Matrices, Polarization, Wafer testing, Signal processing, Independent component analysis, Education and training, Diffraction

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Proceedings Article | 26 March 2019 Paper

Measuring after etch overlay and characterizing tilt fingerprints in multi-tier 3D-NAND structures

Hong-Goo Lee, Dong-Young Lee, Jun-Yeob Kim, Sang-Jun Han, Chan-Ha Park, Jaap Karssenberg, Mir Shahrjerdy, Arno van Leest, Nang-Lyeom Oh, Dong-Hak Lee, Aileen Soco, Tjitte Nooitgedagt

Proceedings Volume 10959, 1095907 (2019) https://doi.org/10.1117/12.2515299

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Etching, Lithography, Scatterometry, Signal detection, Instrument modeling, Optical lithography

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Proceedings Article | 13 March 2018 Presentation + Paper

Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment

Dong-Kiu Park, Hyun-Sok Kim, Moo-Young Seo, Jae-Wuk Ju, Young-Sik Kim, Mir Shahrjerdy, Arno van Leest, Aileen Soco, Giacomo Miceli, Jennifer Massier, Elliott McNamara, Paul Hinnen, Paul Böcker, Nang-Lyeom Oh, Sang-Hoon Jung, Yvon Chai, Jun-Hyung Lee

Proceedings Volume 10585, 105850V (2018) https://doi.org/10.1117/12.2297094

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Control systems, Manufacturing, Etching, Lithography, Critical dimension metrology, Inspection

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Proceedings Article | 22 June 2004 Paper

Reversible watermarking for images

Arno van Leest, Michiel van der Veen, Fons Bruekers

Proceedings Volume 5306, (2004) https://doi.org/10.1117/12.525084

KEYWORDS: Digital watermarking, Distortion, Digital signal processing, Computer programming, Binary data, Signal processing, Associative arrays, Multiplexers, Quality measurement, Data hiding

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Proceedings Article | 20 June 2003 Paper

On digital cinema and watermarking

Arno van Leest, Jaap Haitsma, Ton Kalker

Proceedings Volume 5020, (2003) https://doi.org/10.1117/12.476856

KEYWORDS: Digital watermarking, Linear filtering, Sensors, Cameras, Projection systems, Video, Content addressable memory, Visual system, Convolution

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Proceedings Article | 20 June 2003 Paper

High capacity reversible watermarking for audio

Michiel van der Veen, Fons Bruekers, Arno van Leest, Stephane Cavin

Proceedings Volume 5020, (2003) https://doi.org/10.1117/12.476858

KEYWORDS: Digital watermarking, Computer programming, Signal processing, Signal detection, Sensors, Quantization, Error analysis, Modulation, Digital signal processing, Data hiding

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Showing 5 of 7 publications

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