Dr. Arnold Rosental Profile

Dr. Arnold Rosental

at Tartu Ülikool

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 25 January 2007 Paper

Influence on annealing on atomic layer deposited Cr2O3-TiO2 thin films

Rainer Pärna, Aivar Tarre, Alar Gerst, Hugo Mändar, Ahti Niilisk, Teet Uustare, Arnold Rosental, Väino Sammelselg

Proceedings Volume 6596, 659618 (2007) https://doi.org/10.1117/12.726496

KEYWORDS: Annealing, Titanium, Chromium, Chlorine, Thin films, Raman spectroscopy, Carbon monoxide, Silicon, Reflection, Atomic layer deposition

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Proceedings Article | 12 June 2006 Paper

SnO₂ on sapphire

Aivar Tarre, Arnold Rosental, Teet Uustare, Aarne Kasikov

Proceedings Volume 5946, 59460I (2006) https://doi.org/10.1117/12.639167

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Proceedings Article | 8 August 2003 Paper

Spectroscopic ellipsometry of TiO2/Si

Gintautas Babonas, Ahti Niilisk, Alfonsas Reza, Algirdas Matulis, Arnold Rosental

Proceedings Volume 5122, (2003) https://doi.org/10.1117/12.515700

KEYWORDS: Data modeling, Spectroscopic ellipsometry, Inverse optics, Dielectrics, Crystals, Refractive index, Silicon, Multilayers, Interfaces, Chemical analysis

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Proceedings Article | 8 March 2001 Paper

Atomic scale optical monitoring of the initial growth of TiO2 thin films

A. Niilisk, A. Rosental, A. Gerst, V. Sammelselg, T. Uustare

Proceedings Volume 4318, (2001) https://doi.org/10.1117/12.417579

KEYWORDS: Thin film growth, Thin films, Quartz, Glasses, Dielectrics, Reflection, Crystals, Titanium dioxide

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Proceedings Article | 4 February 1997 Paper

Atomic-layer-deposited TiO2 dielectric coatings

A. Rosental, A. Tarre, A. Gerst, P. Adamson, V. Sammelselg, T. Uustare

Proceedings Volume 2967, (1997) https://doi.org/10.1117/12.266545

KEYWORDS: Atomic layer deposition, Reflectivity, Refractive index, Thin films, Dielectrics, Fused quartz, Interferometry, Transmittance, Mirrors, Titanium dioxide

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Proceedings Volume Editor (1)

SPIE Conference Volume | 3 August 2005

Optical Materials and Applications

Conference Committee Involvement (1)

Optical Materials and Applications

1 August 2005 | Tartu, Estonia

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