Dr. Artem V. Sysa Profile

Dr. Artem V. Sysa

at National Research Univ of Electronic Technology

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 18 April 2021 Poster + Presentation + Paper

Saturable absorber for ring fiber lasers on the base of coupler coated by CNTs

Dmitry Korobko, Dmitry Stoliarov, Pavel Itrin, Valeria Ribenek, Artem Sysa, Yury Shaman, Andrei Fotiadi

Proceedings Volume 11775, 117750X (2021) https://doi.org/10.1117/12.2589130

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Proceedings Article | 30 December 2016 Paper

Metal-assisted chemical etching of silicon with different metal films and clusters: a review

O. Pyatilova, S. Gavrilov, A. Sysa, A. Savitskiy, A. Shuliatyev, A. Dudin, A. Pavlov

Proceedings Volume 10224, 1022405 (2016) https://doi.org/10.1117/12.2266862

KEYWORDS: Silicon, Metals, Wet etching, Silicon films, Nanostructuring, Detection and tracking algorithms, Silver, Etching, Nickel, Semiconducting wafers

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Proceedings Article | 30 December 2016 Paper

Investigation of the phase formation from nickel coated nanostructured silicon

Yulia Shilyaeva, Olga Pyatilova, Alexandra Yu. Berezkina, Artem Sysa, Alexander Dudin, Dmitry Smirnov, Sergey Gavrilov

Proceedings Volume 10224, 102240E (2016) https://doi.org/10.1117/12.2264593

KEYWORDS: Nickel, Nanostructuring, Silicon, Heat treatments, Chemical analysis, Plating, Diffraction, Statistical analysis, Metals, X-rays

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Proceedings Article | 30 December 2016 Paper

Investigation of the reactive ion etching of Ge2Sb2Te5 thin films

A. Shulyatev, A. Sherchenkov, D. Gromov, P. Lazarenko, A. Sysa, A. Kozmin

Proceedings Volume 10224, 102241Y (2016) https://doi.org/10.1117/12.2267138

KEYWORDS: Etching, Thin films, Reactive ion etching, Tellurium, Atomic force microscopy, Germanium, Antimony, Argon, Scanning electron microscopy, Surface roughness

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Proceedings Article | 30 December 2016 Paper

Integral planar supercapacitor with CNT-based composite electrodes for heat-sensitive MEMS and NEMS

E. Lebedev, A. Alekseyev, I. Gavrilin, A. Sysa, E. Kitsyuk, R. Ryazanov, D. Gromov

Proceedings Volume 10224, 102241F (2016) https://doi.org/10.1117/12.2267079

KEYWORDS: Electrodes, Composites, Particles, Carbon nanotubes, Deposition processes, Scanning electron microscopy, Carbon, Microelectromechanical systems, Nanoelectromechanical systems, Semiconducting wafers

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