Dr. Arvind Sundaramurthy Profile

Dr. Arvind Sundaramurthy

Principal Engineer at Intel Corp

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Publications (5)

Proceedings Article | 13 November 2024 Presentation

Co-optimization of photomask exposure conditions and MPC

Michael Erickson, Mahesh Chandramouli, Alex Johnson, Michael Mroz, Vlad Liubich, Zach Rice, Arvind Sundaramurthy, Kushlendra Mishra, Rachit Sharma, Ingo Bork, Alex Wei, Jörg Mellmann, Jiechang Hou

Proceedings Volume 13216, 132161S (2024) https://doi.org/10.1117/12.3038102

KEYWORDS: Photomasks, Critical dimension metrology, SRAF, Scattering, Printing, Bias correction, Forward error correction, Extreme ultraviolet, Modulation, Etching

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Proceedings Article | 10 April 2024 Presentation

Progress in resolving mask making challenges to enable HVM curvilinear patterning

Arvind Sundaramurthy

Proceedings Volume PC12956, PC1295608 (2024) https://doi.org/10.1117/12.3014935

KEYWORDS: Mask making, Optical lithography, High volume manufacturing, Semiconductor manufacturing, Scanning electron microscopy, Optical proximity correction, Lithography, Inspection, Extreme ultraviolet, Electronic design automation

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Proceedings Article | 22 November 2023 Open Access

End to end curvilinear for sub-2nm lithography

Frank Abboud, Mahesh Chandramouli, Arvind Sundaramurthy

Proceedings Volume PC12751, PC1275108 (2023) https://doi.org/10.1117/12.2688594

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Optical proximity correction, Inspection, Ecosystems, Design and modelling, Standards development, Semiconductor manufacturing, Semiconducting wafers

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Proceedings Article | 30 April 2023 Presentation

A CD uniformity study comparing MRC-constrained all-angle to Manhattan OPC corrections on EUV

Ryan Pearman, Ragu Venkatesan, Arvind Sundaramurthy, Patrick Straney, Zach Rice, Rusty Conner, Harsha Grunes

Proceedings Volume 12495, 124950F (2023) https://doi.org/10.1117/12.2662761

KEYWORDS: Photomasks, Optical proximity correction, Extreme ultraviolet, Optics manufacturing, High volume manufacturing, Extreme ultraviolet lithography

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Proceedings Article | 11 November 2022 Presentation

Enabling process optimization for EUV phase shift masks using AIMS(R) EUV phase metrology

Renzo Capelli, Nathan Wilcox, Sven Krannich, Dinumol Devasia, Grizelda Kersteen, Arvind Sundaramurthy, Chang Ju Choi, Sandro Hoffmann, Zachary Rice, Patrick Straney, Klaus Gwosch, Markus Koch, Tim Helbig

Proceedings Volume PC12293, PC122930K (2022) https://doi.org/10.1117/12.2645004

KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Phase shifts, Semiconducting wafers, Phase measurement, Standards development, Scanners, Refraction, Product engineering

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