Dr. Ataklti I. Weldeslassie Profile

Dr. Ataklti I. Weldeslassie

at imec

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Author

Publications (7)

Proceedings Article | 13 November 2024 Presentation

High-NA stitching: how to evaluate performance?

Natalia Davydova, Airat Galiullin, Cyrus Tabery, Bram Slachter, Adam Lyons, Jeremy Chen, Nick Pellens, Vincent Wiaux, Tatiana Kovalevich, Lieve van Look, Ataklti Weldeslassie, Joost Bekaert

Proceedings Volume PC13215, PC132150A (2024) https://doi.org/10.1117/12.3038962

KEYWORDS: Scanners, Semiconducting wafers, Scanning electron microscopy, Photomasks, Overlay metrology, Optical proximity correction, Metrology, Image processing, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 26 August 2024 Paper

High NA EUV stitching: mask performance is a key

Natalia Davydova, Vincent Wiaux, Nick Pellens, Tatiana Kovalevich, Laura Huddleston, Frank Timmermans, Cyrus Tabery, Joost Bekaert, Lieve van Look, Alberto Colina, Bram Slachter, Nitesh Pandey, Stefan Hunsche, Ataklti Weldeslassie, Guillaume Libeert

Proceedings Volume 13177, 131770F (2024) https://doi.org/10.1117/12.3034393

KEYWORDS: Reflectivity, Optical proximity correction, Critical dimension metrology, Reflection, Light sources and illumination, Semiconducting wafers, Tantalum, Design, 3D mask effects, Scanners

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Proceedings Article | 10 April 2024 Presentation + Paper

An experimental stitching study on the eve of high-NA EUV

Vincent Wiaux, Natalia Davydova, Lieve Van Look, Nick Pellens, Ataklti Weldeslassie, Guillaume Libeert, Tatiana Kovalevich, Frank Timmermans, Laura Huddleston

Proceedings Volume 12953, 129530J (2024) https://doi.org/10.1117/12.3010895

KEYWORDS: Critical dimension metrology, Reflectivity, Optical proximity correction, Light sources and illumination, Extreme ultraviolet, Design, Simulations, Scanners, Image processing, Modulation

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Proceedings Article | 21 November 2023 Presentation + Paper

Stitching for high-NA: zooming in on CDU budget

Natalia Davydova, Lieve van Look, Ataklti Weldeslassie, Vincent Wiaux, Laura Huddleston, Bram Slachter, Nick Pellens, Frank Timmermans, Friso Wittebrood, Eelco van Setten, Daniel Wilson

Proceedings Volume 12750, 1275002 (2023) https://doi.org/10.1117/12.2687703

KEYWORDS: Critical dimension metrology, Zoom lenses, Reticles, Metrology, Image quality, Extreme ultraviolet, Stochastic processes, Statistical analysis, Semiconducting wafers, Overlay metrology

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SPIE Journal Paper | 31 January 2023

Probabilistic process window: a new approach to focus-exposure analysis

Chris Mack, Jonathan Yannuzzi, Gian Lorusso, Mohamed Zidan, Danilo De Simone, Ataklti Weldeslassie, Nadia Vandenbroeck, Philippe Foubert, Christophe Beral, Anne-Laure Charley

JM3, Vol. 22, Issue 02, 021007, (January 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.021007

KEYWORDS: Metrology, Error analysis, Measurement uncertainty, Line width roughness, Electroluminescence, Semiconducting wafers, Lithography, Scanning electron microscopy, High volume manufacturing, Scanners

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Proceedings Article | 26 May 2022 Presentation + Paper

Probabilistic process window: a new approach to focus-exposure analysis

Chris Mack, Jonathan Yannuzzi, Gian Lorusso, Mohamed Zidan, Danilo De Simone, Ataklti Weldeslassie, Nadia Vandenbroeck, Philippe Foubert, Christophe Beral, Anne-Laure Charley

Proceedings Volume 12053, 1205307 (2022) https://doi.org/10.1117/12.2614445

KEYWORDS: Metrology, Line width roughness, Lithography, Error analysis, Scanning electron microscopy, Scanners, Critical dimension metrology, Statistical analysis

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Proceedings Article | 20 September 2020 Presentation

Influence and control of CD on defectivity for EUV Pitch 32 Line-Space

Christophe Béral, Anne-Laure Charley, Philippe Leray, Frederic Lazzarino, Romuald Blanc, Poulomi Das, Ataklti Weldeslassie, Amir-Hossein Tamaddon, Werner Gillijns

Proceedings Volume 11517, 115170N (2020) https://doi.org/10.1117/12.2572865

KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Reticles, Extreme ultraviolet lithography, Scanners, Etching

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Showing 5 of 7 publications

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