Dr. Azalia Krasnoperova Profile

Dr. Azalia Krasnoperova

Senior Engineer at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 31 March 2014 Paper

Paper

Computational lithography platform for 193i-guided directed self-assembly

Kafai Lai, Melih Ozlem, Jed Pitera, Chi-chun Liu, Anthony Schepis, Daniel Dechene, Azalia Krasnoperova, Daniel Brue, Jassem Abdallah, Hsinyu Tsai, Mike Guillorn, Joy Cheng, Gregory Doerk, Melia Tjio, Rasit Topalogu, Moutaz Fakhry, Neal Lafferty

Proceedings Volume 9052, 90521A (2014) https://doi.org/10.1117/12.2046920

KEYWORDS: 3D modeling, Monte Carlo methods, Computational lithography, Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Instrument modeling, Optical lithography, Directed self assembly

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Proceedings Article | 16 March 2010 Paper

Paper

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

David Melville, Alan Rosenbluth, Kehan Tian, Kafai Lai, Saeed Bagheri, Jaione Tirapu-Azpiroz, Jason Meiring, Scott Halle, Greg McIntyre, Tom Faure, Daniel Corliss, Azalia Krasnoperova, Lei Zhuang, Phil Strenski, Andreas Waechter, Laszlo Ladanyi, Francisco Barahona, Daniele Scarpazza, Jon Lee, Tadanobu Inoue, Masaharu Sakamoto, Hidemasa Muta, Alfred Wagner, Geoffrey Burr, Young Kim, Emily Gallagher, Mike Hibbs, Alexander Tritchkov, Yuri Granik, Moutaz Fakhry, Kostas Adam, Gabriel Berger, Michael Lam, Aasutosh Dave, Nick Cobb

Proceedings Volume 7640, 764006 (2010) https://doi.org/10.1117/12.846716

KEYWORDS: Source mask optimization, Photomasks, Metals, Lithography, Optical proximity correction, Line edge roughness, Resolution enhancement technologies, Diffractive optical elements, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 4 March 2010 Paper

Paper

Automation of sample plan creation for process model calibration

James Oberschmidt, Amr Abdo, Tamer Desouky, Mohamed Al-Imam, Azalia Krasnoperova, Ramya Viswanathan

Proceedings Volume 7640, 76401G (2010) https://doi.org/10.1117/12.846276

KEYWORDS: Calibration, Process modeling, Statistical modeling, Data modeling, Photoresist processing, Lithography, Computer simulations, Image processing, Metrology, Optical proximity correction

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Proceedings Article | 16 March 2009 Paper

Paper

Benefits and trade-offs of global source optimization in optical lithography

Kehan Tian, Azalia Krasnoperova, David Melville, Alan Rosenbluth, Dario Gil, Jaione Tirapu-Azpiroz, Kafai Lai, Saeed Bagheri, Chia-chen Chen, Bradley Morgenfeld

Proceedings Volume 7274, 72740C (2009) https://doi.org/10.1117/12.814305

KEYWORDS: Diffraction, Printing, Source mask optimization, Optical lithography, Resolution enhancement technologies, Photomasks, Semiconducting wafers, Lithographic illumination, Lithography, Manufacturing

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Proceedings Article | 16 March 2009 Paper

Paper

Improving yield through the application of process window OPC

Jaione Tirapu Azpiroz, Azalia Krasnoperova, Shahab Siddiqui, Kenneth Settlemyer, Ioana Graur, Ian Stobert, James Oberschmidt

Proceedings Volume 7274, 727411 (2009) https://doi.org/10.1117/12.811868

KEYWORDS: Optical proximity correction, Semiconducting wafers, Photomasks, Tolerancing, Lithography, Photoresist processing, Algorithm development, Critical dimension metrology, Yield improvement, Computer simulations

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Proceedings Article | 16 March 2009 Paper

Paper

Overcoming the challenges of 22-nm node patterning through litho-design co-optimization

Martin Burkhardt, J. C. Arnold, Z. Baum, S. Burns, J. Chang, J. Chen, J. Cho, V. Dai, Y. Deng, S. Halle, G. Han, S. Holmes, D. Horak, S. Kanakasabapathy, R. H. Kim, A. Klatchko, C. S. Koay, A. Krasnoperova, Y. Ma, E. McLellan, K. Petrillo, S. Schmitz, C. Tabery, Y. Yin, L. Zhuang, Y. Zou, J. Kye, V. Paruchuri, S. Mansfield, C. Spence, M. Colburn

Proceedings Volume 7274, 727404 (2009) https://doi.org/10.1117/12.814433

KEYWORDS: Etching, Lithography, Printing, Optical lithography, Double patterning technology, Resolution enhancement technologies, Logic, Metals, Photomasks, Tolerancing

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Proceedings Article | 21 March 2006 Paper

Paper

Integration of the retical systematic CD errors into an OPC modeling and correction

Geng Han, Scott Mansfield, Azalia Krasnoperova

Proceedings Volume 6154, 61543I (2006) https://doi.org/10.1117/12.657194

KEYWORDS: Optical proximity correction, Data modeling, Photomasks, Critical dimension metrology, Calibration, Process modeling, Semiconducting wafers, Model-based design, Reticles, Control systems

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Proceedings Article | 20 March 2006 Paper

Paper

Process window OPC for reduced process variability and enhanced yield

Azalia Krasnoperova, James Culp, Ioana Graur, Scott Mansfield, Mohamed Al-Imam, Hesham Maaty

Proceedings Volume 6154, 61543L (2006) https://doi.org/10.1117/12.656835

KEYWORDS: Optical proximity correction, Process modeling, Lithography, Critical dimension metrology, Detection and tracking algorithms, Metals, Manufacturing, Resolution enhancement technologies, Photomasks, Yield improvement

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Proceedings Article | 14 September 2001 Paper

Paper

100-nm gate lithography for double-gate transistors

Azalia Krasnoperova, Ying Zhang, Inna Babich, John Treichler, Jung Yoon, Kathryn Guarini, Paul Solomon

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435793

KEYWORDS: Photomasks, Lithography, Photoresist materials, Field effect transistors, Phase shifts, Oxides, Transistors, Chemical mechanical planarization, Semiconducting wafers, Deep ultraviolet

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Proceedings Article | 25 June 1999 Paper

Paper

Imaging capabilities of proximity x-ray lithography at 70-nm ground rules

Azalia Krasnoperova, Robert Rippstein, Alex Flamholz, Ernst Kratschmer, Shalom Wind, Cameron Brooks, Michael Lercel

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351118

KEYWORDS: Photomasks, X-rays, Photoresist materials, Gold, Semiconducting wafers, Image quality, Lithography, Diffusion, X-ray imaging, X-ray lithography

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Proceedings Article | 25 June 1999 Paper

Paper

X-ray mask defect repair optimization

Zheng Chen, Steven Nash, Azalia Krasnoperova, Chet Wasik

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351119

KEYWORDS: Photomasks, Opacity, X-rays, Printing, Gold, Bridges, X-ray lithography, Ion beams, Lithography, Ions

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Proceedings Article | 6 November 1998 Paper

Paper

Advanced zone plate microfocusing optics

Barry Lai, Wenbing Yun, Jorg Maser, Zhonghou Cai, W. Rodrigues, Dan Legnini, Zhen Chen, Azalia Krasnoperova, Yuli Vladimirsky, Franco Cerrina, Enzo Di Fabrizio, Massimo Gentili

Proceedings Volume 3449, (1998) https://doi.org/10.1117/12.330340

KEYWORDS: Zone plates, X-rays, X-ray optics, Spatial resolution, Diffraction, Optics manufacturing, X-ray lithography, Grazing incidence, Manufacturing, Hard x-rays

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Proceedings Article | 5 June 1998 Paper

Paper

ACLV control in x-ray lithography

Azalia Krasnoperova, Robert Rippstein, Denise Puisto, Janet Rocque

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309568

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, X-rays, X-ray lithography, Error analysis, Lithography, Control systems, Mirrors, Synchrotrons

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Proceedings Article | 5 June 1998 Paper

Paper

X ray fills the gap

Chet Wasik, G. Murphy, Alek Chen, Azalia Krasnoperova, Alex Flamholz, Daniel DeMay, Jeffrey Leavey, Steve Loh, Sue Chaloux, Alan Thomas, Sang Lee, Kenneth Giewont, Paul Agnello

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309566

KEYWORDS: Photomasks, X-rays, Semiconducting wafers, Lithography, X-ray lithography, Etching, Photoresist processing, Logic, Capacitors, X-ray imaging

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Proceedings Article | 7 July 1997 Paper

Paper

Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography

Azalia Krasnoperova, Hiroshi Ito, Gregory Breyta, Debra Fenzel-Alexander

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275871

KEYWORDS: X-rays, Deep ultraviolet, X-ray lithography, Photoresist materials, Lithography, Photomasks, Photoresist developing, Polymers, FT-IR spectroscopy, Critical dimension metrology

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Proceedings Article | 7 July 1997 Paper

Paper

Evaluation of the Defense Advanced Lithography Program (DALP) x-ray lithography aligner

Alek Chen, Alex Flamholz, Azalia Krasnoperova, Robert Rippstein, Ben Vampatella, George Gomba, Robert Fair, William Chu, V. Dimilia, J. Silverman, R. Amodeo, Dave Heald, P. Kochersperger, Carl Stahlhammer

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275803

KEYWORDS: Semiconducting wafers, Photomasks, Optical alignment, X-rays, X-ray lithography, Lithography, Overlay metrology, Calibration, Error analysis, Sensors

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Proceedings Article | 27 May 1996 Paper

Paper

New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile

Oleg Makarov, Zheng Chen, Azalia Krasnoperova, Franco Cerrina, Vadim Cherkashin, Alexander Poleshchuk, Voldemar Koronkevich

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240477

KEYWORDS: Photomasks, X-rays, X-ray lithography, Diffractive optical elements, Lenses, Diffraction, Modulation, Binary data, Polymethylmethacrylate, Computer generated holography

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Proceedings Article | 25 September 1995 Paper

Paper

Microfocusing optics for hard xrays fabricated by x-ray lithography

Azalia Krasnoperova, Zheng Chen, Franco Cerrina, Enzo Di Fabrizio, Massimo Gentili, Wenbing Yun, Barry Lai, Efim Gluskin

Proceedings Volume 2516, (1995) https://doi.org/10.1117/12.221670

KEYWORDS: Gold, Photoresist materials, X-ray lithography, X-rays, Photomasks, Lithography, Polymethylmethacrylate, Electroplating, Optical fabrication, Zone plates

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Proceedings Article | 19 May 1995 Paper

Paper

Effect of the high-contrast-mask sidewall slope on deep x-ray lithography

Zheng Chen, Azalia Krasnoperova, Yueqi Zhu, Franco Cerrina

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209171

KEYWORDS: Photomasks, X-ray lithography, Polymethylmethacrylate, Gold, X-rays, Image processing, Photoresist processing, Image acquisition, Absorption, Micromachining

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Proceedings Article | 13 May 1994 Paper

Paper

Spectral effects on x-ray lithography

Whitson Waldo, Azalia Krasnoperova, Mumit Khan, Cristiano Capasso, James Taylor, Franco Cerrina

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175798

KEYWORDS: Photomasks, Aluminum, Photons, Mirrors, X-ray lithography, Optical filters, Electrons, Absorption, Magnesium, Beryllium

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Proceedings Article | 13 May 1994 Paper

Paper

Modeling of a positive chemically amplified photoresist for x-ray lithography

Azalia Krasnoperova, Steven Rhyner, Yueqi Zhu, James Taylor, Franco Cerrina, Whitson Waldo

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175805

KEYWORDS: Photoresist materials, Diffusion, X-rays, Photoresist developing, X-ray lithography, FT-IR spectroscopy, Photomasks, Absorption, Optical lithography, Polymers

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Proceedings Article | 13 May 1994 Paper

Paper

X-ray lithography processing at CXrL from beamline to quarter-micron NMOS devices

Ramez Nachman, Gong Chen, Michael Reilly, Gregory Wells, John Wallace, Hsin Li, Azalia Krasnoperova, Paul Anderson, Eric Brodsky, Eti Ganin, Stephen Campbell, James Taylor, Franco Cerrina

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175835

KEYWORDS: Photomasks, Semiconducting wafers, Optical alignment, X-rays, X-ray lithography, Mirrors, Coating, Beryllium, X-ray optics, Aluminum

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Proceedings Article | 13 May 1994 Paper

Paper

Comparative study of x-ray lithography process optimization using theoretical and empirical tools

Whitson Waldo, Cristiano Capasso, Azalia Krasnoperova, Mumit Khan, James Taylor, Franco Cerrina

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175833

KEYWORDS: Photomasks, X-ray lithography, Gold, Photoresist processing, Mirrors, Photoresist developing, Photoresist materials, Scanning electron microscopy, Image processing, Diffusion

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Proceedings Article | 15 September 1993 Paper

Paper

Prebake and post-exposure bake effects on the dissolution of AZ-PF

Azalia Krasnoperova, Michael Reilly, S. Turner, L. Ocola, Franco Cerrina

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154767

KEYWORDS: Semiconducting wafers, Chemically amplified resists, Polymers, Photoresist processing, Silver, Optical lithography, Silicon, Chlorine, X-ray lithography, Surface roughness

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Proceedings Article | 15 September 1993 Paper

Paper

Track oriented chemically-amplified resist processes for quarter-micron lithography

Michael Reilly, Azalia Krasnoperova, Quinn Leonard, James Taylor, Shaowie Pan

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154768

KEYWORDS: Photoresist processing, X-ray lithography, Lithography, Standards development, Photomasks, Data processing, Semiconducting wafers, Optimization (mathematics), Algorithm development, Diffusion

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Showing 5 of 25 publications

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