Multilayer structures with a thin chromium (Cr) layer embedded in the high reflective silver layer and dielectric layers, such as SiO2 and Ta2O5, are proposed. Reflectivity can be easily manipulated by adjusting the thickness of the Cr and dielectric layers. To demonstrate the potential for enhancing the flatness of reflection spectra, multilayers with average reflectivity value of 45% and 32% in the range of 450 to 900 nm are constructed, respectively. The reflectivity value exhibits a change of less than ±2.5%, and the transmittance is nearly negligible for both multilayer architectures. They can be fabricated using the physical vapor deposition technique.
Aiming at the development trend of the application of large-aperture optical remote sensors [1], the technical route of plating feasible and effective large-aperture optical element mirrors has been studied. Combining the technical characteristics of the physical vapor deposition of silver mirrors for large-aperture optical elements[2] and related risks, a new process method is proposed based on the relevant characteristics and specific requirements of silver mirrors. The principle of this method is the chemical silver mirror experimental reaction [3]. In this paper, by improving the concentration of the raw materials required for the silver mirror reaction in the laboratory, increasing the surface activity of the substrate, and adjusting the reaction environment, a method that meets the needs of specific production testing is explored. Aperture optical element silver film reflector plating method, and related tests on film firmness, film reflectivity and film surface shape, the test results are in line with the expected requirements, this article is a high-efficiency, high-efficiency large-aperture optical element the thin-film coating of silver-coated mirrors puts forward a new process route.
Silicon carbide has good physical, mechanical and thermal properties, it has been widely used in aerospace field in recent years. In order to meet the requirements of optical performance of space remote sensor, silicon carbide surface is usually treated by surface modification technology for further implement requirements, this process is called modification. There are two ways of modification: PVD and CVD, the purpose is to cover the surface voids of silicon carbide with a modified layer, reducing surface roughness and suppression of surface scattering, improving imaging quality of optical system, improvement of resolution, reducing the loss of light energy .Now, modification technology is mature, but there are still risks in the modification process, there are also corresponding processing risks in the optical polishing process after modification. In order to investigate the influence to pitted reaction bonded SiC (RB-SiC) without SiC or Si cladding layer, 10nmCr, 10nmTi, 10nmGe and100nm Ag films are deposited using thermal evaporation method. The research results show that Ge can decrease the roughness of RB-SiC surface and has preferable smoothing effect of silver thin film comparing to that of Cr and Ti. This article through the research, a method of direct application of non-modified silicon carbide substrates in production practice is explored. The essence is to utilize the growth characteristics of materials, complete growth in the hole, achieve the purpose of filling holes, then the surface roughness is reduced and the surface scattering is suppressed.
With the development of remote sensing technology, the short working wavelength has been extended to 400nm in many current international spatial optical remote sensors. However, the reflectance in the wavelength range from 400nm to 450nm cannot meet the requirement for silver-based mirror. In order to solve this issue, SiO2 and Ta2O5 used as reflectivity enhancement layers are deposited on the silver layer. Simultaneously, the two dielectric films also protect the metallic silver film to from corroding in complicated environment. During the deposition process of Ta2O5 dielectric coating material, oxygen partial pressure, anode voltage and current of the ion source are optimized to get higher refractive index. The values of stress of the SiO2 layer and theTa2O5 layer are analyzed to get the adhesive coatings by the Stony formula and the process parameters of SiO2 dielectric coating material are obtained. The optical constants of these two dielectric films are established by using the Cauchy dispersion formula and the incoherent reflective theory, and then the thicknesses of them are optimized by simplex algorithm. SiO2 layer and Ta2O5 layer are sequentially deposited on the silver layer. The measurement results show that the average reflectivity of the wavelength ranges 400nm-450nm and 400nm-900nm reaches over 95% and 98%, respectively. The reflectivity enhanced silver-based mirror also passes the adhesion test according to relevant technique requirements.
Silicon carbide, as a new reflector material, its excellent physical and chemical properties has been widely recognized by the industry. In order to make SiC mirror better used in space optical system, we used digital coating equipment during its coating process. By using ion-assisted electron evaporation method, we got a complete metal reflective film system on the surface of finely polished silicon carbide mirror. After automated coating process, by adjusting the coating parameters during the process, the surface roughness of silicon carbide improved from 7.8 nm to 5.1 nm, and the average optical reflectance of the surface reached 95% from visible to near-infrared. The metal reflective film system kept well after annealing and firmness test. As a result, the work of this paper will provide an important reference for high-precision coating process on large diameter SiC mirror.
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