Controlling the Local CD Uniformity is important for the implementation of EUV lithography in high-volume production. Spatial frequency breakdown of stochastic effects and identification of stochastic noise contributors may help us to understand the current performance and suggest possibilities and pathways for future improvement. In this work, we look for potentially hidden sources of systematic local variability by collecting and analyzing CD metrology data over lengths greater than a single SEM field of view (FOV). Fourier analysis of the CD data is used to identify any systematic variability. This work will enable a more accurate breakdown of local variability. Additionally, using the length scale of any observed systematic signal we can attempt to trace back the origin and reduce or eliminate its source.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.