Dr. Bartosz Bilski Profile

Dr. Bartosz Bilski

Imaging Performance and Applications Scientist at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 1 December 2022 Presentation + Paper

EUV optics at ZEISS: status and outlook

Bartosz Bilski, Dirk Jürgens, Paul Gräupner

Proceedings Volume 12292, 1229204 (2022) https://doi.org/10.1117/12.2645875

KEYWORDS: Projection systems, Optics manufacturing, Lithography, Extreme ultraviolet, EUV optics, Extreme ultraviolet lithography

Read Abstract +

SPIE Journal Paper | 21 April 2022

Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront description

Laurens de Winter, Timur Tudorovskiy, Jan van Schoot, Kars Troost, Erwin Stinstra, Stephen Hsu, Toralf Gruner, Juergen Mueller, Ruediger Mack, Bartosz Bilski, Joerg Zimmermann, Paul Graeupner

JM3, Vol. 21, Issue 02, 023801, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.023801

KEYWORDS: Wavefronts, Zernike polynomials, Scanners, Extreme ultraviolet, Spherical lenses, Monochromatic aberrations, Mirrors, Extreme ultraviolet lithography, Lithography, Sensors

Read Abstract +

Proceedings Article | 28 September 2021 Presentation

High-NA EUV imaging: from system introduction towards low-k1 extension

Eelco van Setten, Jan Van Schoot, Anton van Oosten, Claire van Lare, Friso Wittebrood, Gijsbert Rispens, Gerardo Bottiglieri, John McNamara, Natalia Davydova, Jo Finders, Joerg Zimmermann, Bartosz Bilski, Paul Graeupner

Proceedings Volume 11854, 118540G (2021) https://doi.org/10.1117/12.2600965

KEYWORDS: Imaging systems, Extreme ultraviolet, Fiber optic illuminators, Transistors, Scanners, Optimization (mathematics), Mirrors, Metals, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 18 November 2020 Presentation + Paper

High NA EUV scanner: obscuration and wavefront description

Laurens de Winter, Timur Tudorovskiy, Jan van Schoot, Kars Troost, Erwin Stinstra, Stephen Hsu, Toralf Gruner, Juergen Mueller, Ruediger Mack, Bartosz Bilski, Joerg Zimmermann, Paul Graeupner

Proceedings Volume 11517, 1151715 (2020) https://doi.org/10.1117/12.2572878

KEYWORDS: Wavefronts, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Transistors, Multilayers, Mirrors

Read Abstract +

Proceedings Article | 29 August 2019 Paper

High-NA EUV imaging: challenges and outlook

Bartosz Bilski, Jörg Zimmermann, Matthias Roesch, Jack Liddle, Eelco van Setten, Gerardo Bottiglieri, Jan van Schoot

Proceedings Volume 11177, 111770I (2019) https://doi.org/10.1117/12.2536329

KEYWORDS: Lithography, Extreme ultraviolet, Projection systems, Diffraction, Extreme ultraviolet lithography, Scanners, EUV optics, Lithographic illumination, Projection lithography, Optical imaging, Computational lithography

Read Abstract +

Proceedings Article | 26 March 2019 Presentation + Paper

High NA EUV lithography: Next step in EUV imaging

Eelco van Setten, Gerardo Bottiglieri, John McNamara, Jan van Schoot, Kars Troost, Joseph Zekry, Timon Fliervoet, Stephen Hsu, Joerg Zimmermann, Matthias Roesch, Bartosz Bilski, Paul Graeupner

Proceedings Volume 10957, 1095709 (2019) https://doi.org/10.1117/12.2514952

KEYWORDS: Source mask optimization, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Photomasks, Diffraction

Read Abstract +

Proceedings Article | 28 September 2017 Paper

Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility

Bartosz Bilski, Ziyang Wang, Friso Wittebrood, John McNamara, Dorothe Oorschot, Mark van de Kerkhof, Timon Fliervoet

Proceedings Volume 10446, 1044605 (2017) https://doi.org/10.1117/12.2280379

KEYWORDS: Scanners, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Photomasks, Extreme ultraviolet, Diffraction, Semiconductors, Overlay metrology, Lithographic illumination, Image contrast enhancement

Read Abstract +

SPIE Journal Paper | 17 May 2017 Open Access

Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology

Bartosz Bilski, Karsten Frenner, Wolfgang Osten

JM3, Vol. 16, Issue 02, 024002, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.024002

KEYWORDS: Critical dimension metrology, Line edge roughness, Model-based design

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 24 March 2017 Paper

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters, Roderik van Es, Jan-Willem Bosker, Alexander Zdravkov, Egbert Lenderink, Fabrizio Evangelista, Par Broman, Bartosz Bilski, Thorsten Last

Proceedings Volume 10143, 101430D (2017) https://doi.org/10.1117/12.2258025

KEYWORDS: Lithography, Scanners, Extreme ultraviolet lithography, Pellicles, Extreme ultraviolet, High volume manufacturing, Fiber optic illuminators, Reticles, Particles, Projection systems

Read Abstract +

Proceedings Article | 5 April 2012 Paper

Sensitivity analysis of line-edge roughness measured by means of scatterometry: a simulation-based investigation

Bartosz Bilski, Karsten Frenner, Wolfgang Osten

Proceedings Volume 8324, 83240J (2012) https://doi.org/10.1117/12.916348

KEYWORDS: Line edge roughness, Critical dimension metrology, Polarization, Scatterometry, Scatter measurement, Semiconductors, Manufacturing, Einsteinium, Cadmium sulfide, Computer simulations

Read Abstract +

Proceedings Article | 14 May 2010 Paper

Investigation of enhanced 2D field-stitching method as a simulation-tool for line-edge roughness in scatterometry

Bartosz Bilski, Karsten Frenner, Wolfgang Osten

Proceedings Volume 7718, 771808 (2010) https://doi.org/10.1117/12.854327

KEYWORDS: Line edge roughness, Diffraction, Scatterometry, Critical dimension metrology, Near field, Refractive index, Lithography, Semiconductors, Metrology, 3D modeling

Read Abstract +

Proceedings Article | 10 September 2007 Paper

3D phase micro-object studies by means of digital holographic tomography supported by algebraic reconstruction technique

B. Bilski, A. Jozwicka, M. Kujawinska

Proceedings Volume 6672, 66720A (2007) https://doi.org/10.1117/12.737314

KEYWORDS: Digital holography, Tomography, Reconstruction algorithms, Refractive index, Holography, Fluctuations and noise, Holograms, Error analysis, 3D acquisition, Fourier transforms

Read Abstract +

Showing 5 of 12 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years