Mr. Brad H. Reelfs Profile

Brad H. Reelfs

Director at Drytek Distribution LLC

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Publications (3)

Proceedings Article | 20 August 2004 Paper

Achieving 65-nm design rule dry etch performance: a study of CD bias, uniformity, and linearity on binary chrome photomasks

Jason Plumhoff, Chris Constantine, Brad Reelfs

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557706

KEYWORDS: Etching, Photomasks, Reactive ion etching, Chromium, Critical dimension metrology, Dry etching, Optical proximity correction, Binary data, Photoresist materials, Lithography

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Proceedings Article | 17 December 2003 Paper

Improvements in binary chrome CD performance utilizing an optimized 4th-generation reactor platform

Jason Plumhoff, Chris Constantine, Jong Shin, Brad Reelfs, Emmanuel Rausa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518138

KEYWORDS: Reactive ion etching, Etching, Chromium, Photomasks, Neodymium, Plasma, Dry etching, Binary data, Diffractive optical elements, Standards development

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Proceedings Article | 28 August 2003 Paper

Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes

Jason Plumhoff, Chris Constantine, Jong Shin, B. Reelfs, Emmanuel Rausa, Jason Benz, Michael Hibbs, Timothy Brunner

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504198

KEYWORDS: Etching, Quartz, Photomasks, Image processing, Diffractive optical elements, Dry etching, Phase shifts, Surface roughness, Scanning electron microscopy, Chromium

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