In this talk we present on recent advancements in hybrid-glass waveguides on silicon photonic platforms. We describe novel monolithic hybrid integration approaches and waveguide designs for functional glass claddings on silicon-on-insulator (SOI). We describe our results on low-loss hybrid tellurite-silicon waveguides, high-Q resonators, and amplifiers and lasers and our recent efforts to optimize their performance and utility in silicon photonic systems. Such devices are promising for new functionalities in sensing, metrology, computing, and communications applications.
We describe a prototyping process for silicon nitride photonic integrated circuits, targeting applications in the visible and near-infrared wavelength ranges. The platform is based on direct-write electron beam lithography technology and provides a route toward the rapid fabrication of passive and thermo-optic active photonic devices. The fabrication turnaround time is on the order of several weeks, and critical feature sizes are demonstrated down to 100 nm which enables the fabrication of subwavelength metastructures. Two waveguiding material thicknesses have been demonstrated, 150 nm for visible light applications and 400 nm for infrared.
We demonstrate integrated distributed Bragg reflector lasers on a hybrid platform composed of silicon nitride waveguides coated with erbium-doped tellurium dioxide. The asymmetrical laser cavities are enclosed by gratings patterned on the 2.2-cm-long waveguide walls. Cavities with varying grating strengths are studied, yielding laser efficiencies up to 0.36%, a minimum lasing threshold of 13 mW, and emission wavelengths between 1530 and 1565 nm.
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