Mr. Bryan W. Reese Profile

Bryan W. Reese

Technical Specialist

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 25 September 2010 Paper

28N foundry reticle requal challenges and solutions for IC fabs

Mike Yeh, David Wu, Bo Mu, Bryan Reese

Proceedings Volume 7823, 782338 (2010) https://doi.org/10.1117/12.867258

KEYWORDS: Inspection, Reticles, SRAF, Photomasks, Air contamination, Semiconducting wafers, Contamination, Metals, Defect detection, Wafer inspection

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Proceedings Article | 11 May 2009 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proceedings Volume 7379, 737935 (2009) https://doi.org/10.1117/12.824355

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Data analysis, Defect inspection, Photomasks, Air contamination, Databases, Manufacturing, Error analysis

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Proceedings Article | 24 March 2009 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proceedings Volume 7272, 72723P (2009) https://doi.org/10.1117/12.815545

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Data analysis, Defect inspection, Photomasks, Air contamination, Databases, Manufacturing, Error analysis

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Proceedings Article | 17 October 2008 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proceedings Volume 7122, 71223F (2008) https://doi.org/10.1117/12.801524

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Data analysis, Defect inspection, Photomasks, Air contamination, Databases, Manufacturing, Error analysis

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Proceedings Article | 25 October 2007 Paper

Characterizing contamination inspection capabilities using programmed defect test reticles

Anthony Nhiev, John Riddick, Joseph Straub, Trent Hutchinson, Bryan Reese, Aditya Dayal

Proceedings Volume 6730, 673028 (2007) https://doi.org/10.1117/12.746822

KEYWORDS: Inspection, Reticles, Optical spheres, Photomasks, Contamination, Manufacturing, Defect detection, Computer aided design, Light sources, Quartz

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The ORION^TM series of test reticles have been used for many years as the photomask industry standard for evaluating contamination inspection algorithms. The deposition of Polystyrene Latex (PSL) spheres on various reticle pattern designs allow STARlight^TM tool owners to measure the relative contamination inspection performance in a consistent and quantifiable manner. However, with recent inspection technology advances such as shorter laser (light source) wavelengths and smaller inspection pixels, PSL spheres were observed to physically degrade over relatively short time periods: especially for the smallest sized spheres used to characterize contamination inspection performance at the most advanced technology nodes. Investigations into using alternative materials or methods that address the issue of PSL shrinkage have not yet proven completely successful. Problems such as failure to properly adhere to reticle surfaces or identification of materials that can produce consistent and predictable sphere sizes for the reliable manufacture of these critical test masks are only some of the challenges that must be solved. Even if these and other criteria are met, the final substance must appear to inspection optics as pseudo soft defects which resemble actual contamination that inevitably appears on production reticle surfaces. In the interim, programmed pindot defects present in the quartz region of the SPICA^TM test reticle are being used to characterize contamination performance while a suitable long-term solution to address the issue of shrinking PSL spheres on ORION masks can be found. This paper examines the results of a programmed pindot test reticle specifically designed to evaluate contamination algorithms without the deposition of PSL spheres or similar structures. This alternative programmed pindot test reticle uses various background patterns similar to the ORION, however, it also includes multiple defects sizes and locations making it more desirable than the limited range of defects found on the SPICA.

Proceedings Article | 20 October 2006 Paper

Single pass die-to-database tritone reticle inspection capability

Bryan Reese, Jan Heumann, Norbert Schmidt

Proceedings Volume 6349, 63493L (2006) https://doi.org/10.1117/12.686121

KEYWORDS: Inspection, Reticles, Databases, Binary data, Calibration, Sensors, Detection and tracking algorithms, Photomasks, Image processing, Neodymium

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Proceedings Article | 20 October 2006 Paper

High-resolution mask inspection in advanced fab

Stephanie Maelzer, Andre Poock, Bryan Reese, Kaustuve Bhattacharyya, Farzin Mirzaagha, Stephen Cox, Michael Lang

Proceedings Volume 6349, 63490S (2006) https://doi.org/10.1117/12.686402

KEYWORDS: Inspection, Reticles, Semiconducting wafers, Photomasks, Wafer inspection, Metals, Defect inspection, Lithography, Image transmission, Visualization

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Proceedings Article | 23 March 2006 Paper

Building 1x NIL templates: challenges and requirements

Tony DiBiase, John Maltabes, Bryan Reese, Mohsen Ahmadian

Proceedings Volume 6151, 61511E (2006) https://doi.org/10.1117/12.655887

KEYWORDS: Nanoimprint lithography, Reticles, Inspection, Manufacturing, Lithography, Photomasks, Etching, Quartz, Defect inspection, Image transmission

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Proceedings Article | 6 December 2004 Paper

Chromeless phase lithography reticle defect inspection challenges and solutions

Larry Zurbrick, Anthony Vacca, Byran Reese, Douglas Van Den Broeke, Stephen Hsu, Darren Taylor, Bryan Kasprowicz

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569287

KEYWORDS: Inspection, Reticles, Manufacturing, Photomasks, Etching, Defect detection, Lithography, Quartz, Sensors, Resolution enhancement technologies

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Proceedings Article | 28 August 2003 Paper

Automatic inspection tool sensitivity with characterization of AAPSM defects

Darren Taylor, Eric Poortinga, Bryan Reese, Blake Gibson

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504204

KEYWORDS: Inspection, Defect inspection, Photomasks, Scanning electron microscopy, Manufacturing, Phase shifting, Glasses, 193nm lithography, Lithography, Etching

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Proceedings Article | 22 January 2001 Paper

OPC reticle inspection techniques

Aihua Dong, Bryan Reese

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410743

KEYWORDS: Inspection, Reticles, Optical proximity correction, Defect detection, Semiconducting wafers, Defect inspection, Databases, Feature extraction, Zoom lenses, Detection and tracking algorithms

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Showing 5 of 11 publications

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