Seeing an increasingly critical role of MI in the semiconductor industry, in this keynote, we will first review the evolution of the MI technologies in the last few decades, and then discuss the challenges we are presently engaging in, focusing on the EUV era metrology topics: thin resist, 3D and massive measurement. Most importantly, as an obligation of one of the leading equipment suppliers in this field, we will present a vision for the future technologies, in response to the keynotes from the device makers in recent years, mainly focus on electron beam tools but also to cover a certain range of different field technologies.
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