Recently, improvements built upon the core Luminex analyzer technologies have resulted in the development of BeadPix; a low-cost, compact, rugged, diagnostic and environmental testing xMAP analyzer. This instrument moves away from a flow cytometry-based system to an instrument that employs Light Emitting Diodes (LEDs) and a CCD imager, coupled with an improved magnetic microsphere-based array (MagPlex(tm)).
Femtosecond time-resolved and continuous wave optical techniques have been used to study fundamental nanoscale materials issues in III-nitride semiconductors relevant to the realization of high quality ultraviolet light emitters and photodetectors. It is demonstrated that compositional fluctuations in AlGaN active regions grown by plasma-assisted MBE can be employed to create nanoscale spatial localization that enhances the luminescence efficiency and PL lifetime (300-400 ps) despite high defect density (>1010cm-2) by inhibiting movement of carriers to nonradiative sites. Significant enhancement of this phenomenon has been obtained in a DH LED structure grown on a lower defect density (mid-109cm-2) AlGaN template, with PL lifetime increased by nearly a factor of two, corresponding to a defect density in the mid-107 cm-2 range, and only a 3.3 times drop in PL intensity when the temperature is raised from 12 K to room temperature, suggesting up to ~ 30% internal quantum efficiency. Femtosecond, time-resolved electroabsorption measurements of nanoscale high field transport in an AlGaN/GaN heterojunction p-i-n diode show an onset of velocity overshoot at an electric field of ~105 kV/cm for transport in the c-direction of wurzite GaN. Theoretical Monte Carlo calculations employing a full band structure indicate that at fields below ~300 kV/cm this velocity overshoot is associated primarily with band nonparabolicity in the Γ valley related to a negative electron effective mass. In addition, these calculations show that similar behavior is not expected for transport in the basal plane until much higher fields are attained, with important implications for the design of high power, high frequency electronics and avalanche photodetectors.
In this paper we report on the fabrication and characterization of GaN, AlGaN, and AlN layers grown by hydride vapor phase epitaxy (HVPE). The layers were grown on 2-inch and 4-inch sapphire and 2-inch silicon carbide substrates. Thickness of the GaN layers was varied from 2 to 80 microns. Surface roughness, Rms, for the smoothest GaN layers was less than 0.5 nm, as measured by AFM using 10 μm x 10 μm scans. Background Nd-Na concentration for undoped GaN layers was less than 1x1016 cm-3. For n-type GaN layers doped with Si, concentration Nd-Na was controlled from 1016 to 1019 cm-3. P-type GaN layers were fabricated using Mg doping with concentration Na-Nd ranging from 4x1016 to 3x1018 cm-3, for various samples. Zn doping also resulted in p-type GaN formation with concnetration ND-NA in the 1017 cm-3 range. UV transmission, photoluminescence, and crystal structure of AlGaN layers with AlN concentration up to 85 mole.% were studied. Dependence of optical band gap on AlGaN alloy composition was measured for the whole composition range. Thick (up to 75 microns) crack-free AlN layers were grown on SiC substrates. Etch pit density for such thick AlN layers was in the 107 cm-2 range.
We have used subpicosecond time-resolved photoluminescence (TRPL) downconversion techniques to study the interplay of carrier localization and radiative and nonradiative processes in the active regions of light emitting III-nitride semiconductor ultraviolet optical sources, with the goal of identifying potential approaches that will lead to higher radiative efficiency. Comparison of TRPL in (In)AlGaN multiple quantum well active regions indicate that for addition of only 0.01 In content the PL decay time in an InAlGaN MQW is more than double that in an AlGaN MQW designed to emit at the same wavelength (360 nm), thus indicating the importance of indium for improvement of material quality, most likely through the suppression of point defects. This result is further underscored by TRPL data on 320 nm InAlGaN MQW active regions, which exhibit longer PL lifetimes than expected for growth on GaN templates with dislocation densities in the mid-108cm-2 range. While the PL lifetimes in these InAlGaN MQWs improve for growth on lower dislocation density HVPE bulk GaN substrates, a similar phenomenon is not observed for deposition on nearly dislocation-free bulk AlN substrates, suggesting that defect generation in the MQWs associated with lattice mismatch or AlN surface preparation may play an important role. The pump intensity dependence of the time zero signal and the TRPL decays in the MQWs implies that internal electric field-induced recombination through the barriers and interface states plays an important role in the radiative efficiency of quantum well active regions for c-axis oriented materials and devices. The effect of these internal electric fields can be mitigated through the use of nonpolar MQWs. The combination of more intense time-integrated PL spectra and shorter PL lifetimes with decreasing well width in GaN/AlGaN MQWs grown on a-plane LEO GaN for low pump intensity suggests that the radiative lifetime becomes shorter due to the accompanying increase in exciton binding energy and oscillator strength at smaller well width in these high quality samples. Finally, it is demonstrated that compositional fluctuations in AlGaN active regions grown by plasma-assisted MBE can be employed to create spatial localization that enhances the luminescence efficiency and PL lifetime (300-400 ps) despite high defect density (>1010cm-2) by inhibiting movement of carriers to nonradiative sites. Significant enhancement of this phenomenon has been obtained in a DH LED structure grown on a lower defect density (mid-109cm-2) AlGaN template, with PL lifetime increased by nearly a factor of two, corresponding to a defect density in the mid-107 cm-2 range, and only a 3.3 times drop in PL intensity when the temperature is raised from 12 K to room temperature, suggesting up to ~ 30% internal quantum efficiency.
This paper surveys recent work in several photodetector areas including high-speed, low-noise avalanche photodiodes, high-power photodiodes, solar-blind ultra-violet PIN photodiodes, and quantum dot infrared photodetectors (QDIPs).
This paper surveys recent work in several photodetector areas including high-speed, low-noise avalanche photodiodes, solar-blind ultra-violet PIN photodiodes, and quantum dot infrared photodetectors (QDIPs).
We have used femtosecond time-resolved reflectivity and luminescence downconversion techniques to study carrier relaxation, localization, and recombination in III-nitride semiconductors. Intensity dependent, frequency degenerate pump-probe reflectivity measurements employing near-bandgap excitation provide information about initial carrier localization, subsequent ultrafast heat generation due to nonradiative recombination or trapping in states deep in the bandgap, and photoinduced absorption associated with excitation of carriers from localized states to the bands. These phenomena and their experimental signatures are illustrated for Al0.25Ga0.75N and Al0.4Ga0.6N samples, in which the photoinduced change in reflectivity ΔR decays faster with decreasing intensity and changes sign, with faster decays for a given intensity in the higher Al content sample. This behavior suggests that in these cases the dynamics are governed by trapping at localized states associated with alloy fluctuations that become deeper and more numerous as the Al content increases. Within this context the sign change and subsequent temporal evolution of ΔR may be indicative of ultrafast heat generation and/or photoinduced absorption, depending upon A1 content. Nondegenerate pump-probe reflectivity experiments designed to separate the electronic contributions of the ΔR decays from the slower thermal components by using a sub-bandgap probe are used to measure carrier lifetime in GaN. Comparison with data obtained from frequency degenerate experiment sunder identical excitation conditions employing a near bandgap probe indicate that in the frequency degenerate case the decay times in ΔR are inflated due to the presence of an additional long-lived component with the same sign as the electronic contribution. The sign and power dependence of this slow decay suggest that it may be associated with screening of a surface electric field by carriers trapped in deep states. In addition, a new technique is presented that employs luminescence downconversion using an ultrashort gating pulse to enable the characterization of UV light emission from III-nitride semiconductors with subpicosecond temporal resolution. This technique also allows one to measure PL rise times and fast components of multiple decays in the subsequent time evolution of the PL intensity. Comparison of luminescence emission intensity and lifetime in GaN and AlGaN with ~0.1 Al content grown homoepitaxially on GaN templates with the same quantities measured in heteroepitaxial layers grown on sapphire indicate significant improvement in the homoepitaxial layers due to reduction in defect density. Fast (<15 ps) initial decays in the AlGaN are attributed to localization in shallow traps associated with alloy fluctuations, with subsequent recombination through gap states.
We present an optically-detected time-of-flight technique with femtosecond resolution that monitors the change in the electroabsorption due to charge transport in a p-i-n diode, and show how it may be used to determine the electron transit time, velocity overshoot, and velocity-field characteristic in GaN at room temperature. In a GaN homojunction p-i-n diode, the transit time drops with increasing electric field E in the intermediate field regime (50 - 100 kV/cm), and the electron velocity possesses a weak, quasi-linear dependence on E attributed to polar optical phonon scattering. In the high field regime the transit time and the electron velocity gradually become independent of E. The peak electron velocity of 1.9 X 107 cm/s, corresponding to a transit time of approximately 2.5 ps across the 0.53 micrometers depletion region, is attained at approximately 225 kV/cm. The experimental results are in qualitative agreement with theoretical steady-state velocity-field characteristics found in the literature. A measurement of the high field (approximately 300 kV/cm) transient electron velocity overshoot was also performed using a semi-transparent p-contact AlGaN/GaN heterojunction p-i-n diode. The peak electron velocity of 6.25 X 107 cm/s attained within the first 200 fs decays within 1 ps to a steady-state velocity of 3.2 X 107 cm/s in this improved device.
The detection of light in the ultraviolet (UV) portion of the electromagnetic spectrum is critical to a number of commercial and military applications. Until very recently, the primary means of light detection in the UV was with either silicon photodiodes or photomultiplier tubes, both of which have serious drawbacks. With the advent of optoelectronic devices fabricated in the ternary alloy of AlGaN, the possibility exists to produce high- performance solid-state photodetector arrays that are sensitive to the visible-blind and solar-blind regions of the spectrum. In this paper, we discuss recent advances in the area of ultraviolet photodetectors fabricated on GaN and AlGaN.
We report on the improved quantum efficiency of both GaN homojunction and AlxGa1-xN/GaN heterojunction photodiodes using a recessed window device structure. A very high quantum efficiency of 77 percent at 357 nm and also a much improved quantum efficiency at the solar blind wavelengths were achieved. A spatial non-uniformity problem on the large area devices was observed with 2D raster scan photocurrent measurements. The spatial non-uniformity is attributed to an electric field crowding effect that is primarily caused by the high resistivity of the p-GaN layer with the aid of Medici simulations.
The detection of light in the UV portion of the electromagnetic spectrum is critical to a number of applications. Until very recently, the primary means of light detection in the UV was with either silicon photodiodes or photomultiplier tubes, both of which have serious drawbacks. With the advent of optoelectronic devices fabricated in the ternary alloy of AlGaN, the possibility exists to produce high-performance solid-state photodetector arrays sensitive to the visible-blind and solar-blind regions of the spectrum. In this paper, we discuss recent advances in the area of UV photodetectors fabricated on GaN and AlGaN. Various device structures are presented, and their peculiar characteristics discussed in terms of responsivity, dark current, gain, temporal response, and frequency response. Models describing the current transport mechanisms and the quantum efficiencies of these photodiodes are discussed. Special emphasis is given to novel device structures that improve on the temporal, spectral, and electrical characteristics of AlGaN-based photodiodes. Specifically, results for a transparent recessed-window p-i- n device, and a semi-transparent electrode device structure are described. Finally, the results of a separate absorption, charge, and multiplication avalanche photodetector are presented. This device structure resulted in a stable gain of > 10 at a reverse bias of approximately 40 V.
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