Dr. Chen-Rui Tseng Profile

Dr. Chen-Rui Tseng

Manager at Taiwan Mask Corp

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Publications (4)

Proceedings Article | 17 April 2012 Paper

The effect of puddle megasonic cleaning for advanced photomask with subresolution assist features (SRAFs)

Ming-Chih Chen, Hsiang-Jen Yang, Chen-Rui Tseng

Proceedings Volume 8352, 83520T (2012) https://doi.org/10.1117/12.921280

KEYWORDS: SRAF, Chromium, Cavitation, Oxides, Photomasks, Particles, Binary data, Inspection, Atomic force microscopy, Extreme ultraviolet

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Proceedings Article | 30 October 2007 Paper

Performance improvement of ALTA4700 for 130nm and below mask productivity

Jyh Wei Hsu, David Lee, Chen Rui Tseng, Eric Hong, Chun Hung Wu

Proceedings Volume 6730, 67300I (2007) https://doi.org/10.1117/12.746654

KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Dry etching, Etching, Printing, Photoresist processing, Diffusion, Deep ultraviolet, Metrology

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Proceedings Article | 20 October 2006 Paper

Evaluation of writing strategy with one and two pass on OPC technology using EBM writing system

Chen-Rui Tseng, Kevin Cheng, David Lee, Sheng-Bay Yang, Chun-Hung Wu

Proceedings Volume 6349, 63494C (2006) https://doi.org/10.1117/12.686377

KEYWORDS: Optical proximity correction, Photomasks, Electron beam melting, Resolution enhancement technologies, Electron beam lithography, Critical dimension metrology, Mask making, Beam shaping, Standards development

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Proceedings Article | 21 June 2006 Paper

The performance of positive and negative CAR mask exposed by Leica 20 KeV writing system

Chen-Rui Tseng, Eng-Ann Gan, David Lee, Chun-Hung Wu, Shiuh-Bin Chen

Proceedings Volume 6281, 62810L (2006) https://doi.org/10.1117/12.692646

KEYWORDS: Photomasks, Critical dimension metrology, Photoresist processing, Chemically amplified resists, Electron beam lithography, Mask making, Chemical analysis, Catalysis, Scanning electron microscopy, Photomicroscopy

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