Mr. Chih-Hao Huang Profile

Chih-Hao Huang

Inventor at Macronix International Co Ltd

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Author

Publications (12)

Proceedings Article | 10 April 2024 Poster + Paper

Overlay control improvements through dynamic sampling

Onur Demirer, Robin Maximilian Zech, Chao-Jen Tsou, W. Wang, C. Huang, Elvis Yang, Afu Chiu, Alexander Muehle, Holger Bald, Clemens Utzny, Scott Eitapence, Boris Habets

Proceedings Volume 12955, 1295527 (2024) https://doi.org/10.1117/12.3009830

KEYWORDS: Semiconducting wafers, Overlay metrology, Control systems, Simulations, Scanners, Metrology, Lithography, Advanced process control, High volume manufacturing

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Proceedings Article | 28 April 2023 Poster + Paper

Development of novel focus spot detection methods for high-volume manufacturing

Syed Naime Mohammad, Chao-Jen Tsou, Afu Chiu, Norman Birnstein, Erick deGouw, Clemens Utzny, Philip Groeger, Stefan Buhl, W. Wang, C. Huang, Elvis Yang, T. Yang, K. Chen

Proceedings Volume 12494, 1249415 (2023) https://doi.org/10.1117/12.2657965

KEYWORDS: Semiconducting wafers, Scanners, Contamination, High volume manufacturing, Particles, Neodymium, Tunable filters, Defense systems, Sensors, Image enhancement

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Proceedings Article | 26 May 2022 Poster + Paper

Exposure process optimization using machine learning overlay prediction

Masahiro Yoshida, W. H. Wang, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Yosuke Takarada, Yoshiki Sakamoto, Shin-ichi Egashira, Ken Otani, Tsukasa Saito, Shoshi Katayama, Seiya Miura, Douglas Shelton

Proceedings Volume 12053, 120531L (2022) https://doi.org/10.1117/12.2611020

KEYWORDS: Data modeling, Semiconducting wafers, Overlay metrology, Machine learning, 3D modeling, Lithography, Data acquisition, Wafer testing, Target detection, Process modeling

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Proceedings Article | 26 May 2022 Poster + Paper

Machine learning modeling using process context and exposure data for overlay prediction

W. H. Wang, Irina Brinster, Mohsen Maniat, Fatima Anis, Yen-Hui Lee, Sven Boese, C. F. Tseng, Wei-Yuan Chu, Boris Habets, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen

Proceedings Volume 12053, 120531Q (2022) https://doi.org/10.1117/12.2613202

KEYWORDS: Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Optical parametric oscillators, Performance modeling, Process modeling, Machine learning, Semiconductor manufacturing, Data processing

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Proceedings Article | 27 March 2017 Paper

Pattern collapse solution for asymmetric pattern

C. J. Tu, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen

Proceedings Volume 10146, 101461P (2017) https://doi.org/10.1117/12.2256653

KEYWORDS: Process control, Antireflective coatings, Interfaces, Capillaries, Photoresist developing, Photoresist materials, Back end of line, Metals, Optical lithography, Copper, Semiconducting wafers, Coating

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Proceedings Article | 18 March 2015 Paper

Reducing the substrate dependent scanner leveling effect in low-k1 contact printing

C. S. Chang, C. F. Tseng, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen

Proceedings Volume 9426, 94261F (2015) https://doi.org/10.1117/12.2083811

KEYWORDS: Semiconducting wafers, Near infrared, Scanners, Printing, Sensors, Chemical mechanical planarization, Etching, Dielectrics, Opacity, Silicon

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Proceedings Article | 29 March 2013 Paper

PEB to development delay influence on contact patterning by negative tone development process

C. Chen, C. Lin, C. Huang, Elvis Yang, T. Yang, Chih-Yuan Lu

Proceedings Volume 8682, 86821P (2013) https://doi.org/10.1117/12.2010755

KEYWORDS: Diffusion, Contamination, Optical lithography, Manufacturing, Semiconducting wafers, Compact discs, Photoresist processing, Polymers, Printing, Critical dimension metrology

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Proceedings Article | 3 April 2012 Paper

Overlay target design and evaluation for SADP process

C. Yeh, Chao-Tien Huang, Kengchi Lin, C. Huang, Elvis Yang, T. Yang, K. Chen, Chih-Yuan Lu

Proceedings Volume 8324, 832431 (2012) https://doi.org/10.1117/12.914439

KEYWORDS: Image segmentation, Overlay metrology, Photomasks, Etching, Image processing, Semiconducting wafers, Scatterometry, Scanning electron microscopy, Lithography, Coating

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Proceedings Article | 21 April 2011 Paper

Process solutions for reducing PR residue over non-planar wafer

C. H. Lin, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu

Proceedings Volume 7971, 79712C (2011) https://doi.org/10.1117/12.879195

KEYWORDS: Etching, Photomasks, Photoresist processing, Optical lithography, Semiconducting wafers, Printing, Image processing, Critical dimension metrology, Coating, Reflectivity

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Proceedings Article | 20 April 2011 Paper

Wafer-edge defect reduction for tri-layer materials in BEOL applications

J. R. Du, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu

Proceedings Volume 7971, 79712L (2011) https://doi.org/10.1117/12.879191

KEYWORDS: Semiconducting wafers, Etching, Optical lithography, Coating, Back end of line, Lithography, Plasma etching, Silicon, Reflectivity, Photoresist processing

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Proceedings Article | 1 April 2009 Paper

Contact formation with extremely low proximity effect by double patterning technology

C. W. Yeh, S. S. Yu, H. J. Lee, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu

Proceedings Volume 7273, 72731E (2009) https://doi.org/10.1117/12.812466

KEYWORDS: Etching, Lithography, Photomasks, Double patterning technology, Optical lithography, Dielectrics, Image processing, Photoresist materials, Semiconducting wafers, Immersion lithography

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Proceedings Article | 5 April 2007 Paper

The novel advanced process control to eliminate AlCu-PVD induced overlay shift

CH Huang, CC Yang, Elvis Yang, TH Yang, KC Chen, Joseph Ku, CY Lu

Proceedings Volume 6518, 651845 (2007) https://doi.org/10.1117/12.706758

KEYWORDS: Metals, Overlay metrology, Etching, Chemical mechanical planarization, Semiconducting wafers, Image registration, Process control, Tungsten, Model-based design, Tolerancing

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Showing 5 of 12 publications

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