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Ching Hsueh
at SAMSUNG Austin Semiconductor LLC
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Publications (1)
Proceedings Article | 22 February 2021 Paper
e-Beam detection of over-etch in semiconductor processing and how over-etch level is related to defect detection parameters
Kwame Owusu-Boahen, Chang (Carl) Han, Ching Hsueh, Chulwoo (Jake) Kim, Arun Vijayakumar, Fnu Devender, David Moreau
Proceedings Volume 11611, 116110N (2021) https://doi.org/10.1117/12.2584652
KEYWORDS: Semiconductor manufacturing, Defect detection, Failure analysis, Inspection, Transmission electron microscopy, Optical inspection, Image analysis
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