Dr. Christian Crell Profile

Dr. Christian Crell

Staff Engineer

SPIE Involvement:

Author

Area of Expertise:

lithography mask technology , technical buyer , supplier management , project management , customer consulting

Publications (3)

Proceedings Article | 17 December 2003 Paper

High-accuracy simulation-based optical proximity correction

Martin Keck, Thomas Henkel, Ralf Ziebold, Christian Crell, Jörg Thiele

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517462

KEYWORDS: Optical proximity correction, Data modeling, Photomasks, Scanning electron microscopy, Printing, Manufacturing, Semiconducting wafers, Critical dimension metrology, Lithography, Data processing

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Proceedings Article | 9 April 2001 Paper

Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm

Larry Zurbrick, David Emery, Maciej Rudzinski, Mark Wihl, Michel Prudhomme, Christian Crell, Uwe Griesinger, Manuel Vorwerk, Mario Hennig

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425092

KEYWORDS: Inspection, Phase shifts, Defect detection, Reticles, Algorithm development, Photomasks, Detection and tracking algorithms, Defect inspection, Contamination, Signal detection

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Proceedings Article | 3 February 2000 Paper

Defect printability and repair of alternating phase-shift masks

Christoph Friedrich, Martin Verbeek, Leonhard Mader, Christian Crell, Rainer Pforr, Uwe Griesinger

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377104

KEYWORDS: Photomasks, Quartz, Inspection, Etching, Semiconducting wafers, Chromium, Phase shifts, Phase shifting, Ions, Printing

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