Dr. Christine Y. Ouyang Profile

Dr. Christine Y. Ouyang

at Applied Materials Inc

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 1 April 2013 Paper

Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Souvik Chakrabarty, Christine Ouyang, Marie Krysak, Markos Trikeriotis, Kyoungyoung Cho, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 8679, 867906 (2013) https://doi.org/10.1117/12.2011490

KEYWORDS: Nanoparticles, Photoresist materials, Electron beam lithography, Oxides, Spectroscopy, Ions, Extreme ultraviolet lithography, Optical lithography, Carbon, Photoresist developing

Read Abstract +

Proceedings Article | 29 March 2013 Paper

Non-aqueous negative-tone development of inorganic metal oxide nanoparticle photoresists for next generation lithography

Christine Ouyang, Yeon Sook Chung, Li Li, Mark Neisser, Kyoungyong Cho, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 8682, 86820R (2013) https://doi.org/10.1117/12.2011282

KEYWORDS: Electron beam lithography, Nanoparticles, Photoresist materials, Photoresist developing, Oxides, Lithography, Extreme ultraviolet lithography, Metals, Etching, Line edge roughness

Read Abstract +

Proceedings Article | 28 March 2012 Paper

Negative-tone development of photoresists in environmentally friendly silicone fluids

Christine Ouyang, Jin-Kyun Lee, Christopher Ober

Proceedings Volume 8325, 832524 (2012) https://doi.org/10.1117/12.916297

KEYWORDS: Silicon, Photoresist developing, Photoresist materials, Lithography, Glasses, Electron beam lithography, Liquids, Molecules, Microfluidics, Natural surfaces

Read Abstract +

Proceedings Article | 23 March 2012 Paper

A new inorganic EUV resist with high-etch resistance

Markos Trikeriotis, Marie Krysak, Yeon Sook Chung, Christine Ouyang, Brian Cardineau, Robert Brainard, Christopher Ober, Emmanuel Giannelis, Kyoungyong Cho

Proceedings Volume 8322, 83220U (2012) https://doi.org/10.1117/12.916384

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Etching, Nanoparticles, Resistance, Extreme ultraviolet, Absorbance, Electron beam lithography, Line edge roughness, Hafnium

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Solvent development processing of chemically amplified resists: chemistry, physics, and polymer science considerations

Christopher Ober, Christine Ouyang, Jin-Kyun Lee, Marie Krysak

Proceedings Volume 7972, 797205 (2011) https://doi.org/10.1117/12.882959

KEYWORDS: Photoresist developing, Polymers, Photoresist materials, Silicon, Carbon dioxide, Molecules, Line edge roughness, Electron beam lithography, Chemically amplified resists, Glasses

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Patterning conventional photoresists in environmentally friendly silicone fluids

Christine Ouyang, Jin-Kyun Lee, Marie Krysak, Christopher Ober

Proceedings Volume 7972, 79720O (2011) https://doi.org/10.1117/12.879294

KEYWORDS: Silicon, Photoresist materials, Photoresist developing, Microfluidics, Silicon carbide, Lithography, Polymers, Hydrogen, Optical lithography, Microelectronics

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Environmentally friendly natural materials-based photoacid generators for next-generation photolithography

Youngjin Cho, Christine Ouyang, Marie Krysak, Wenjie Sun, Victor Gamez, Reyes Sierra-Alvarez, Christopher Ober

Proceedings Volume 7972, 79722A (2011) https://doi.org/10.1117/12.879816

KEYWORDS: Lithography, Scanning electron microscopy, Electron beam lithography, Photoresist materials, Semiconducting wafers, Nitrogen, Chromatography, Polymers, Optical lithography, Glucose

Read Abstract +

Proceedings Article | 30 March 2010 Paper

Environmentally friendly processing of photoresists in scCO[sub]2[/sub] and decamethyltetrasiloxane

Christine Ouyang, Jin-Kyun Lee, Jing Sha, Christopher Ober

Proceedings Volume 7639, 763912 (2010) https://doi.org/10.1117/12.848336

KEYWORDS: Photoresist materials, Glasses, Photoresist developing, Polymers, Silicon, Fluorine, Electron beam lithography, Microelectronics, Plasma etching, Optical lithography

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years