Mr. Christophe Defranoux Profile

Christophe Defranoux

at SOPRALAB

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 27 December 2002 Paper

Precise and accurate characterization of DUV and V-UV phase-shifting mask materials by combined V-UV spectroscopic ellipsometry and x-ray reflectometry

Pierre Boher, Adrien Darragon, Christophe Defranoux, Jean-Claude Fouere, Jean-Louis Stehle

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.474127

KEYWORDS: Spectroscopic ellipsometry, Reflectometry, X-rays, Thin films, Deep ultraviolet, Reflectivity, Phase shifts, Surface roughness, X-ray characterization, Transmittance

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Proceedings Article | 10 December 2001 Paper

IR spectroscopic ellipsometry for industrial characterization of semiconductors

Pierre Boher, Marc Bucchia, Jean-Philippe Piel, Christophe Defranoux, Jean-Louis Stehle, Christopher Pickering

Proceedings Volume 4449, (2001) https://doi.org/10.1117/12.450110

KEYWORDS: Infrared spectroscopy, Silicon, Dielectrics, Semiconductors, Spectroscopic ellipsometry, Polarizers, Fluorine, Infrared radiation, Spectroscopy, Absorption

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Proceedings Article | 20 April 2001 Paper

Characterization of ultrathin gate dielectrics using combined grazing x-ray reflectance and spectroscopic ellipsometry

Pierre Boher, Jean-Philippe Piel, Patrick Evard, Christophe Defranoux, Jean-Louis Stehle

Proceedings Volume 4405, (2001) https://doi.org/10.1117/12.425256

KEYWORDS: Dielectrics, X-rays, Spectroscopic ellipsometry, Oxides, Reflectivity, Interfaces, Silicon, Nitrogen, Process control, Metrology

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Proceedings Article | 2 June 2000 Paper

New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Pierre Boher, Jean-Philippe Piel, Patrick Evrard, Christophe Defranoux, Marta Espinosa, Jean-Louis Stehle

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386494

KEYWORDS: X-rays, Photoresist materials, Spectroscopic ellipsometry, Reflectivity, Dielectrics, Thin films, Ultraviolet radiation, Spectroscopy, Reflection, Transmittance

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Proceedings Article | 14 June 1999 Paper

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology

Pierre Boher, Christophe Defranoux, Sophie Bourtault, Jean-Louis Stehle

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350873

KEYWORDS: Semiconducting wafers, Photoresist materials, Deep ultraviolet, Antireflective coatings, Mirrors, Spectroscopes, Multilayers, Spectroscopy, Spectroscopic ellipsometry, Wafer-level optics

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Proceedings Article | 11 June 1999 Paper

New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

Pierre Boher, Christophe Defranoux, Jean-Philippe Piel, Jean-Louis Stehle

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350195

KEYWORDS: Photoresist materials, Refractive index, Absorption, Spectroscopy, Semiconducting wafers, Spectroscopic ellipsometry, Silicon, Calibration, Refraction, Lithography

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Proceedings Article | 28 April 1999 Paper

New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

Pierre Boher, Christophe Defranoux, Jean-Philippe Piel, Jean-Louis Stehle

Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346880

KEYWORDS: Photoresist materials, Refractive index, Absorption, Spectroscopy, Spectroscopic ellipsometry, Semiconducting wafers, Silicon, Lithography, Time metrology, Calibration

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Proceedings Article | 27 April 1999 Paper

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm-wafer technology

Pierre Boher, Christophe Defranoux, Sophie Bourtault, Jean-Louis Stehle

Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346910

KEYWORDS: Photoresist materials, Semiconducting wafers, Deep ultraviolet, Antireflective coatings, Mirrors, Spectroscopes, Spectroscopic ellipsometry, Wafer-level optics, Multilayers, Spectroscopy

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Proceedings Article | 7 July 1997 Paper

Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry

Pierre Boher, Jean-Louis Stehle, Jean-Philippe Piel, Christophe Defranoux, Louis Hennet

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275961

KEYWORDS: Deep ultraviolet, Reflectivity, X-rays, Absorption, Spectroscopic ellipsometry, Silicon, Optical testing, Reflection, UV optics, Antireflective coatings

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Proceedings Article | 16 August 1996 Paper

Spectroscopic ellipsometry and photometry applied to color filter characterization

Christophe Defranoux, Jean-Philippe Piel, Jean-Louis Stehle

Proceedings Volume 2873, (1996) https://doi.org/10.1117/12.246214

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Proceedings Article | 16 August 1996 Paper

Fine characterization of ITO layers by spectroscopic ellipsometry

Pierre Boher, Christophe Defranoux, Jean-Philippe Piel, Jean-Louis Stehle, Y. Suzuki

Proceedings Volume 2873, (1996) https://doi.org/10.1117/12.246246

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Proceedings Article | 16 August 1996 Paper

Thickness and index measurements of 8-um liquid crystal gap between plates by spectroscopic ellipsometry

Christophe Defranoux, Jean-Louis Stehle

Proceedings Volume 2873, (1996) https://doi.org/10.1117/12.246257

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Proceedings Article | 7 June 1996 Paper

Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range

Pierre Boher, Jean-Philippe Piel, Christophe Defranoux, Jean-Louis Stehle, Louis Hennet

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240988

KEYWORDS: Deep ultraviolet, Reflectivity, Absorption, Ultraviolet radiation, Spectroscopic ellipsometry, X-rays, Antireflective coatings, Reflection, Silicon, Oxides

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Showing 5 of 13 publications

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