Dr. Christopher C. Walton Profile

Dr. Christopher C. Walton

Staff Experimental Physicist at Lawrence Livermore National Lab

SPIE Involvement:

Author

Publications (30)

Proceedings Article | 4 October 2022 Presentation + Paper

Multilayer coating design methods for a high-energy x-ray imaging optic with complex design requirements

Chris Walton, Bernard Kozioziemski, Jeffrey Fein, Suzanne Romaine, Julia Vogel

Proceedings Volume 12240, 1224005 (2022) https://doi.org/10.1117/12.2633400

KEYWORDS: Coating, Reflectivity, Multilayers, X-ray optics, X-ray imaging, Plasmas, Optical design, Fusion energy, X-rays, Monte Carlo methods

Read Abstract +

Proceedings Article | 5 June 2018 Paper

Aperiodic x-ray multilayer interference coatings with high reflectance and large field of view

Catherine Burcklen, Tom Pardini, Jennifer Alameda, Jeff Robinson, Eberhard Spiller, Chris Walton, Paul Mirkarimi, Stefan Hau-Riege, Regina Soufli

Proceedings Volume 10691, 106910U (2018) https://doi.org/10.1117/12.2314257

KEYWORDS: Reflectivity, Multilayers, Silicon, Interfaces, X-rays, Molybdenum, Silicon carbide, Data modeling, Systems modeling

Read Abstract +

Proceedings Article | 29 August 2017 Paper

Characterization of multilayer coated replicated Wolter optics for imaging x-ray emission from pulsed power

A. Ames, D. Ampleford, C. Bourdon, R. Bruni, K. Kilaru, B. Kozioziemski, M. Pivovaroff, B. Ramsey, S. Romaine, J. Vogel, C. Walton, M. Wu

Proceedings Volume 10399, 103991X (2017) https://doi.org/10.1117/12.2275721

KEYWORDS: Multilayers, X-ray optics, Optical coatings, Laser optics, X-ray characterization, X-rays, Pulsed power, Prototyping, Optical fabrication, X-ray imaging

Read Abstract +

Proceedings Article | 9 September 2015 Paper

Calibration results for first NIF Kirkpatrick-Baez microscope

Nicolai Brejnholt, Jay Ayers, Thomas McCarville, Tom Pardini, Louisa Pickworth, David Bradley, Todd Decker, Stefan Hau-Riege, Randal Hill, Michael Pivovaroff, Regina Soufli, Julia Vogel, Chris Walton

Proceedings Volume 9591, 95910J (2015) https://doi.org/10.1117/12.2187150

KEYWORDS: Mirrors, Spatial resolution, National Ignition Facility, Calibration, Multilayers, X-rays, X-ray imaging, Sensors, Reflectivity, Microscopes

Read Abstract +

Proceedings Article | 10 September 2014 Paper

Engineering precision relocation capability into a large-cantilevered telescoping diagnostic for a Kirkpatrick Baez x-ray Optic

M. Ayers, L. Pickworth, T. Decker, R. Hill, T. Pardini, T. McCarville, N. Shingleton, C. Smith, C. Bailey, P. Bell, D. Bradley, N. Brejnholt, S. Hau-Riege, M. Pivovaroff, P. Mirkarimi, M. Vitalich, J. Vogel, C. Walton, J. Kilkenny

Proceedings Volume 9211, 92110C (2014) https://doi.org/10.1117/12.2065253

KEYWORDS: Mirrors, Diagnostics, National Ignition Facility, X-rays, Digital Light Processing, X-ray imaging, Image filtering, Optical alignment, Microscopes, Sensors

Read Abstract +

Proceedings Article | 27 September 2013 Paper

Corrosion-resistant Mg/SiC multilayer coatings for EUV laser sources in the 25-80nm wavelength region

Regina Soufli, Mónica Fernández-Perea, Jeff Robinson, Sherry Baker, Jennifer Alameda, Christopher Walton, Luis Rodríguez-De Marcos, Jose Méndez, Juan Larruquert, Manuela Vidal-Dasilva, Eric Gullikson

Proceedings Volume 8849, 88490D (2013) https://doi.org/10.1117/12.2024955

KEYWORDS: Multilayers, Corrosion, Reflectivity, Silicon carbide, Magnesium, Aluminum, Extreme ultraviolet, Transmission electron microscopy, Laser sources, Scanning electron microscopy

Read Abstract +

Proceedings Article | 26 September 2013 Paper

Optical and multilayer design for the first Kirkpatrick-Baez optics for x-ray diagnostic at NIF

Tom Pardini, Tom McCarville, Christopher Walton, Todd Decker, Julia Vogel, Paul Mirkarimi, Jennifer Alameda, Randy Hill, Louisa Pickworth, Vladimir Smalyuk, Jay Ayers, Perry Bell, Dave Bradley, Joe Kilkenny, Mike Pivovaroff

Proceedings Volume 8850, 88500E (2013) https://doi.org/10.1117/12.2024133

KEYWORDS: Multilayers, X-ray optics, National Ignition Facility, Diagnostics, Sensors, X-rays, Optical coatings, Optical design, Mirrors, Ray tracing

Read Abstract +

Proceedings Article | 26 September 2013 Paper

M-ARIANE (Mirror-assisted Active Readout In A Neutron Environment): an x-ray imaging system for implosion experiments on the National Ignition Facility at ignition neutron yields

V. Smalyuk, J. Ayers, P. Bell, L. R. Benedetti, D. Bradley, C. Cerjan, J. Emig, B. Felker, S. Glenn, C. Hagmann, J. Holder, N. Izumi, J. Kilkenny, J. Koch, O. Landen, J. Moody, K. Piston, N. Simanovskaia, C. Walton

Proceedings Volume 8850, 88500B (2013) https://doi.org/10.1117/12.2025555

KEYWORDS: X-rays, X-ray imaging, Cameras, Imaging systems, Mirrors, National Ignition Facility, Photons, Sensors, Interference (communication), Multilayers

Read Abstract +

Proceedings Article | 18 May 2007 Paper

Multilayers for next-generation x-ray sources

S. Bajt, H. Chapman, E. Spiller, S. Hau-Riege, J. Alameda, A. Nelson, C. Walton, B. Kjornrattanawanich, A. Aquila, F. Dollar, E. Gullikson, C. Tarrio, S. Grantham

Proceedings Volume 6586, 65860J (2007) https://doi.org/10.1117/12.724786

KEYWORDS: Reflectivity, Mirrors, Multilayers, Free electron lasers, Silicon, X-ray optics, X-rays, X-ray sources, Coating, Optical components

Read Abstract +

Proceedings Article | 28 June 2006 Paper

Deformable nanolaminate optics

Alexandros Papavasiliou, Scot Olivier, Troy Barbee, Robin Miles, Chris Walton, Michael Cohn, Kevin Chang

Proceedings Volume 6272, 62722N (2006) https://doi.org/10.1117/12.672733

KEYWORDS: Mirrors, Actuators, Metals, Lithography, Silicon, Epoxies, Nickel, Deformable mirrors, Semiconducting wafers, Adhesives

Read Abstract +

Proceedings Article | 23 January 2006 Paper

MEMS actuated deformable mirror

Alexandros Papavasiliou, Scot Olivier, Troy Barbee, Chris Walton, Michael Cohn

Proceedings Volume 6113, 61130P (2006) https://doi.org/10.1117/12.657667

KEYWORDS: Actuators, Microelectromechanical systems, Mirrors, Metals, Deformable mirrors, Electrodes, Gold, Silicon, Prototyping, Sputter deposition

Read Abstract +

Proceedings Article | 8 September 2005 Paper

Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems

Kenneth Goldberg, Patrick Naulleau, Senajith Rekawa, Paul Denham, J. Liddle, Eric Gullikson, Keith Jackson, Erik Anderson, John Taylor, Gary Sommargren, Henry Chapman, Donald Phillion, Michael Johnson, Anton Barty, Regina Soufli, Eberhard Spiller, Christopher Walton, Sasa Bajt

Proceedings Volume 5900, 59000G (2005) https://doi.org/10.1117/12.618066

KEYWORDS: Extreme ultraviolet, Optical testing, Interferometry, EUV optics, X-ray optics, X-rays, Lenses, Light sources, Astronomical imaging, X-ray astronomy

Read Abstract +

Proceedings Article | 29 January 2004 Paper

EUV multilayers for solar physics

David Windt, S. Donguy, John Seely, Benjawan Kjornrattanawanich, Eric Gullikson, C. C. Walton, L. Golub, E. DeLuca

Proceedings Volume 5168, (2004) https://doi.org/10.1117/12.506175

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Iron, X-rays, Silicon, Optical coatings, Absorption, Solar processes, EUV optics

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Static EUV micro-exposures using the ETS Set-2 optics

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Jeffrey Bokor, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Christopher Walton, Donna O'Connell, Pei-Yang Yan, Guojing Zhang

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490129

KEYWORDS: Lithography, Extreme ultraviolet, Printing, Photomasks, EUV optics, Wafer-level optics, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Understanding particle defect transport in an ultra clean sputter coating process

Christopher Walton, Patrick Kearney, James Folta, Donald Sweeney, Paul Mirkarimi

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484970

KEYWORDS: Particles, Semiconducting wafers, Photomasks, Ion beams, Coating, Extreme ultraviolet lithography, Optical spheres, Ions, Atmospheric particles, Multilayers

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks

Alan Stivers, Ted Liang, Michael Penn, Barry Lieberman, Gilbert Shelden, James Folta, Cindy Larson, Paul Mirkarimi, Christopher Walton, Eric Gulliksong, Moonsuk Yi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468199

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Particles, Gold, Extreme ultraviolet lithography, Semiconducting wafers, Optical spheres, Multilayers

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Static microfield printing at the advanced light source with the ETS Set-2 optic

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, David Attwood, Phillip Batson, Jeffrey Bokor, Paul Denham, Eric Gullikson, Bruce Harteneck, Brian Hoef, Keith Jackson, Deirdre Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth Blaedel, Henry Chapman, Layton Hale, Regina Soufli, Eberhard Spiller, Donald Sweeney, John Taylor, Christopher Walton, Avijit Ray-Chaudhuri, Donna O'Connell, Richard Stulen, Daniel Tichenor, Charles Gwyn, Pei-yang Yan, Guojing Zhang

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472318

KEYWORDS: Printing, Extreme ultraviolet, Lithography, Fiber optic illuminators, Interferometry, Mirrors, Reticles, Modulation transfer functions, Wavefronts, Critical dimension metrology

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Advances in low-defect multilayers for EUVL mask blanks

James Folta, J. Courtney Davidson, Cindy Larson, Christopher Walton, Patrick Kearney

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472287

KEYWORDS: Photomasks, Ions, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers, Ion beams, Etching, Silicon, Coded apertures, Molybdenum

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Regina Soufli, Eberhard Spiller, Mark Schmidt, Courtney Davidson, R. Fred Grabner, Eric Gullikson, Benjamin Kaufmann, Stanley Mrowka, Sherry Baker, Henry Chapman, Russell Hudyma, John Taylor, Christopher Walton, Claude Montcalm, James Folta

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436695

KEYWORDS: Multilayers, Mirrors, Reflectivity, Optical coatings, Extreme ultraviolet lithography, Scattering, Extreme ultraviolet, Light scattering, Imaging systems, Cameras

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Predictive model of the cost of extreme-ultraviolet lithography masks

Scott Hector, Patrick Kearney, Claude Montcalm, James Folta, Christopher Walton, William Tong, John Taylor, Pei-yang Yan, Charles Gwyn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410754

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Inspection, Coating, Optical lithography, Lithography, Process modeling, Defect detection, Ion beams

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Extreme ultraviolet lithography: reflective mask technology

Christopher Walton, Patrick Kearney, Paul Mirkarimi, Joel Bowers, Charles Cerjan, Abbie Warrick, Karl Wilhelmsen, Eric Fought, Craig Moore, Cindy Larson, Sherry Baker, Scott Burkhart, Scott Hector

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390088

KEYWORDS: Coating, Photomasks, Extreme ultraviolet lithography, Multilayers, Semiconducting wafers, Silicon, Gold, Optical spheres, Reflectivity, Defect detection

Read Abstract +

EUVL mask blanks consist of a distributed Bragg reflector made of 6.7 nm-pitch bi-layers of Mo and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150 mm substrates, it was upgraded in July 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects > 100 nm below 0.05/cm². These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross- platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank performance at EUV wavelengths.

Proceedings Article | 21 July 2000 Paper

Actinic defect counting statistics over 1-cm2 area of EUVL mask blank

Seongtae Jeong, Chih-wei Lai, Senajith Rekawa, Christopher Walton, Jeffrey Bokor

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390080

KEYWORDS: Inspection, Extreme ultraviolet, Photons, Photomasks, Extreme ultraviolet lithography, Interference (communication), Mirrors, Defect inspection, Scattering, Particles

Read Abstract +

Proceedings Article | 21 July 2000 Paper

EUVL printing results of a low-thermal expansion material (LTEM) mask

William Tong, John Taylor, Scott Hector, Melissa Shell, Guojing Zhang, Patrick Kearney, Christopher Walton, Cindy Larson, James Wasson, Pawitter Mangat, Donna O'Connell, Daniel Folk

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390038

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Manufacturing, Printing, Distortion, Lithography, Extreme ultraviolet, Reflectivity

Read Abstract +

Proceedings Article | 30 December 1999 Paper

Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography

Seongtae Jeong, Chih-wei Lai, Senajith Rekawa, Christopher Walton, Shon Prisbrey, Jeffrey Bokor

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373375

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Scattering, Photomasks, Sensors, Scanners, Signal detection, Defect inspection, Multilayers

Read Abstract +

Proceedings Article | 30 December 1999 Paper

Comparison of at-wavelenth inspection, printability, and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography (EUVL)

Gregory Cardinale, John Goldsmith, Avijit Ray-Chaudhuri, Aaron Fisher, Scott Hector, Pawitter Mangat, Zorian Masnyj, David Mancini, Bill Wilkinson, Jeffrey Bokor, Seongtae Jeong, Scott Burkhart, Charles Cerjan, Christopher Walton, Cindy Larson, Pei-yang Yan, Guojing Zhang

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373339

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Inspection, Chromium, Scanning electron microscopy, Reticles, Silicon films, Printing

Read Abstract +

Proceedings Article | 23 November 1999 Paper

Multilayer coated optics for an alpha-class extreme ultraviolet lithography system

Claude Montcalm, R. Fred Grabner, Russell Hudyma, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, James Folta

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371119

KEYWORDS: Reflectivity, Multilayers, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Projection systems, Lithography, Optical components, Mirrors, EUV optics

Read Abstract +

Proceedings Article | 25 June 1999 Paper

Low-defect reflective mask blanks for extreme ultraviolet lithography

Scott Burkhart, Charles Cerjan, Patrick Kearney, Paul Mirkarimi, Christopher Walton, Avijit Ray-Chaudhuri

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351130

KEYWORDS: Photomasks, Multilayers, Silicon, Extreme ultraviolet, Semiconducting wafers, Particles, Extreme ultraviolet lithography, Reflectivity, Scanning electron microscopy, Inspection

Read Abstract +

Proceedings Article | 25 June 1999 Paper

Advances in multilayer reflective coatings for extreme ultraviolet lithography

James Folta, Sasa Bajt, Troy Barbee, R. Fred Grabner, Paul Mirkarimi, Tai Nguyen, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, Claude Montcalm

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351156

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Optical coatings, Extreme ultraviolet, Mirrors, EUV optics, Lithography, Projection systems, Silicon

Read Abstract +

Proceedings Article | 23 April 1999 Paper

Mask technology for EUV lithography

M. Bujak, Scott Burkhart, Charles Cerjan, Patrick Kearney, Craig Moore, Shon Prisbrey, Donald Sweeney, William Tong, Stephen Vernon, Christopher Walton, Abbie Warrick, Frank Weber, Marco Wedowski, Karl Wilhelmsen, Jeffrey Bokor, Sungho Jeong, Gregory Cardinale, Avijit Ray-Chaudhuri, Alan Stivers, Edita Tejnil, Pei-yang Yan, Scott Hector, Khanh Nguyen

Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346225

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers, Reflectivity, Extreme ultraviolet, Silicon, Inspection, Optical lithography, Ion beams

Read Abstract +

Proceedings Article | 27 May 1996 Paper

Effect of silica overlayers on laser damage of HfO2-SiO2 56 degrees incidence high reflectors

Christopher Walton, Francois Genin, Robert Chow, Mark Kozlowski, Gary Loomis, Edward Pierce

Proceedings Volume 2714, (1996) https://doi.org/10.1117/12.240406

KEYWORDS: Laser damage threshold, Silica, Polarization, Atomic force microscopy, Interfaces, Reflectors, Laser induced damage, Multilayers, Coating, Resistance

Read Abstract +

Showing 5 of 30 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years