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Chumeng Zheng
at ASML Silicon Valley
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Publications (1)
Proceedings Article | 20 March 2018 Paper
Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models
Boris Menchtchikov, Robert Socha, Chumeng Zheng, Sudhar Raghunathan, Igor Aarts, Krishanu Shome, Jonathan Lee, Chris de Ruiter, Manouk Rijpstra, Henry Megens, Ralph Brinkhof, Floris Teeuwisse, Leendertjan Karssemeijer, Irina Lyulina, Chung-Tien Li, Jan Hermans, Philippe Leray
Proceedings Volume 10587, 105870C (2018) https://doi.org/10.1117/12.2297493
KEYWORDS: Optical alignment, Monte Carlo methods, Overlay metrology, Polarization, Sensors, Chemical mechanical planarization, Etching, Scanners
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