CONFERENCE PROCEEDINGS
Advanced Search
Claudio Masia
Regional Technology Support at Applied Materials Europe BV
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 16 April 2010 Paper
Metrology qualification of EUV resists
Liraz Gershtein, Ram Peltinov, Stefano Ventola, Claudio Masia, Chanjuan Xing
Proceedings Volume 7638, 76383D (2010) https://doi.org/10.1117/12.849020
KEYWORDS: Line edge roughness, Extreme ultraviolet, Scanning electron microscopy, Extreme ultraviolet lithography, Metrology, Critical dimension metrology, Edge roughness, Lithography, Semiconducting wafers, Photomasks
Proceedings Article | 25 March 2008 Paper
Novel approach for immersion lithography defectivity control to increase productivity
Ilan Englard, Raf Stegen, Peter Vanoppen, Ingrid Minnaert-Janssen, Ted der Kinderen, Erik van Brederode, Frank Duray, Jeroen Linders, Denis Ovchinnikov, Rich Piech, Claudio Masia, Noam Hillel, Erez Ravid, Ofer Rotlevi, Amir Wilde, Saar Shabtay, Zach Telor, Robert Schreutelkamp
Proceedings Volume 6922, 69223U (2008) https://doi.org/10.1117/12.776085
KEYWORDS: Inspection, Scanning electron microscopy, Semiconducting wafers, Photodynamic therapy, Polarization, Particles, Immersion lithography, Scanners, Deep ultraviolet, Image classification
Proceedings Article | 24 March 2008 Paper
Accurate in-resolution level overlay metrology for multipatterning lithography techniques
Ilan Englard, Richard Piech, Claudio Masia, Noam Hillel, Liraz Gershtein, Dana Sofer, Ram Peltinov, Ofer Adan
Proceedings Volume 6922, 69221D (2008) https://doi.org/10.1117/12.776099
KEYWORDS: Overlay metrology, Critical dimension metrology, Lithography, Metrology, Process control, Scanners, Optical lithography, Double patterning technology, Semiconducting wafers, Monochromatic aberrations
Proceedings Article | 5 April 2007 Paper
Metrology challenges for advanced lithography techniques
Ilan Englard, Peter Vanoppen, Jo Finders, Ingrid Minnaert-Janssen, Frank Duray, Jeroen Meessen, Gert-Jan Janssen, Ofer Adan, Liraz Gershtein, Ram Peltinov, Claudio Masia, Richard Piech
Proceedings Volume 6518, 65181G (2007) https://doi.org/10.1117/12.713455
KEYWORDS: Overlay metrology, Critical dimension metrology, Etching, Lithography, Monte Carlo methods, Scanning electron microscopy, Metrology, Semiconducting wafers, Reticles, Algorithm development
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top