Dr. Cyril Vannuffel Profile

Dr. Cyril Vannuffel

at CEA-LETI

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 5 March 2021 Presentation

Advanced roughness characterization for 300mm Si photonics patterning and optimization

Remi Le Tiec, Shimon Levi, Angela Kravtsov, Olga Novak, Cecilia Dupre, Cyril Vannuffel, Tristan Dewolf, Stephanie Garcia, Quentin Wilmart, Jonathan Faugier-Tovar

Proceedings Volume 11690, 116900K (2021) https://doi.org/10.1117/12.2578550

KEYWORDS: Silicon photonics, Silicon, Photonics, Optical lithography, Line edge roughness, Wafer-level optics, Metrology, Line width roughness, Semiconducting wafers

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Proceedings Article | 1 October 2013 Paper

Extreme long range process effects characterization and compensation

Thiago Figueiro, Clyde Browning, Martin Thornton, Cyril Vannuffel, Kang-Hoon Choi, Christoph Hohle, Jean-Herve Tortai, Patrick Schiavone

Proceedings Volume 8886, 88860F (2013) https://doi.org/10.1117/12.2030664

KEYWORDS: Semiconducting wafers, Calibration, Point spread functions, Reticles, Electron beam lithography, Mathematical modeling, Chemical mechanical planarization, Modulation, Forward error correction, Metrology

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Proceedings Article | 23 September 2013 Paper

Metrology variability and its impact in process modeling

Thiago Figueiro, Mohamed Saib, Kang-Hoon Choi, Christoph Hohle, Martin Thornton, Cyril Vannufel, Jean-Hervé Tortai, Patrick Schiavone

Proceedings Volume 8880, 888020 (2013) https://doi.org/10.1117/12.2026423

KEYWORDS: Calibration, Metrology, Semiconducting wafers, Error analysis, Process modeling, Data modeling, Point spread functions, Opacity, Electron beam lithography, Statistical modeling

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Proceedings Article | 10 September 2011 Paper

Overlay measurement by angle resolved Mueller polarimetry

Clément Fallet, Tatiana Novikova, Aline Jolibois, Bicher Haj Ibrahim, Antonello De Martino, Cyril Vannuffel

Proceedings Volume 8160, 81600J (2011) https://doi.org/10.1117/12.893805

KEYWORDS: Overlay metrology, Polarimetry, Error analysis, Semiconducting wafers, Metrology, Microelectronics, Optical imaging, Objectives, Photomasks, Process control

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SPIE Journal Paper | 1 July 2011

Overlay measurements by Mueller polarimetry in back focal plane

Clément Fallet, Tatiana Novikova, Martin Foldyna, Sandeep Manhas, Bicher Haj Ibrahim, Antonello De Martino, Cyril Vannuffel, Christophe Constancias

JM3, Vol. 10, Issue 03, 033017, (July 2011) https://doi.org/10.1117/12.10.1117/1.3626852

KEYWORDS: Overlay metrology, Polarimetry, Error analysis, Silicon, Semiconducting wafers, Metrology, Optical testing, Microscopes, Critical dimension metrology, Mueller matrices

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Proceedings Article | 20 April 2011 Paper

Overlay measurements by Mueller polarimetry in the back focal plane

Tatiana Novikova, Clément Fallet, Martin Foldyna, Sandeep Manhas, Bicher Haj Ibrahim, Antonello De Martino, Cyril Vannuffel, Christophe Constancias

Proceedings Volume 7971, 797115 (2011) https://doi.org/10.1117/12.879499

KEYWORDS: Overlay metrology, Polarimetry, Metrology, Error analysis, Microscopes, Silicon, Critical dimension metrology, Manufacturing, Semiconducting wafers, Optical testing

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Proceedings Article | 26 March 2007 Paper

Exposure of molecular glass resist by e-beam and EUVIL

Cyril Vannuffel, Damien Djian, Serge Tedesco, Dimitra Niakoula, Panagiotis Argitis, Veroniki Vidali, Elias Couladouros, Harun Solak

Proceedings Volume 6519, 651949 (2007) https://doi.org/10.1117/12.714263

KEYWORDS: Head-mounted displays, Line edge roughness, Cadmium sulfide, Glasses, Molecules, Lithography, Extreme ultraviolet lithography, Photoresist processing, Electron beam lithography, Diffusion

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Proceedings Article | 29 March 2006 Paper

Overcoming pattern collapse on e-beam and EUV lithography

A. Jouve, J. Simon, A. Pikon, H. Solak, C. Vannuffel, J.-H. Tortai

Proceedings Volume 6153, 61531C (2006) https://doi.org/10.1117/12.656400

KEYWORDS: Electron beam lithography, Capillaries, Liquids, Adhesives, Extreme ultraviolet lithography, Interfaces, Lithography, Polymers, Chemically amplified resists, Extreme ultraviolet

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Showing 5 of 8 publications

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