Mr. Dae-Jin Park Profile

Dae-Jin Park

at SK Hynix Inc

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Author

Publications (5)

Proceedings Article | 20 March 2018 Presentation + Paper

Model-assisted template extraction SRAF application to contact holes patterns in high-end flash memory device fabrication

Ahmed Seoud, Juhwan Kim, Yuansheng Ma, Srividya Jayaram, Le Hong, Gyu-Yeol Chae, Jeong-Woo Lee, Dae-Jin Park, Hyoung-Soon Yune, Se-Young Oh, Chan-Ha Park

Proceedings Volume 10587, 105870L (2018) https://doi.org/10.1117/12.2297659

KEYWORDS: SRAF, Lithography, Optical proximity correction, Optical lithography

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Proceedings Article | 16 March 2016 Paper

Process window variation comparison between NTD and PTD for various contact type

Doyoun Kim, Hyoungsoon Yune, Daejin Park, Joohong Jeong, Woosung Moon, Mingu Kim, Seyoung Oh, Chanha Park, Hyunjo Yang

Proceedings Volume 9780, 97800D (2016) https://doi.org/10.1117/12.2218858

KEYWORDS: Lithography, Source mask optimization, Optical lithography, Semiconducting wafers, Wafer-level optics, Critical dimension metrology, Ultraviolet radiation, Image compression, Photomasks, Atrial fibrillation

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Proceedings Article | 14 December 2009 Paper

Study of OPC accuracy by illumination source types

Kiho Yang, Daejin Park, Jeonkyu Lee, Sangjin Oh, Jinhyuck Jeon, Taejun You, Chanha Park, Donggyu Yim, Sungki Park

Proceedings Volume 7520, 75202A (2009) https://doi.org/10.1117/12.837224

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Lithography, Transistors, Semiconducting wafers, Polarization, Image processing, Process modeling, Scanners

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Proceedings Article | 4 December 2008 Paper

Novel process proximity correction by the pattern-to-pattern matching method with DBM

Dae-Jin Park, Jinyoung Choi, Hyoungsoon Yune, Jaeseung Choi, Cheolkyun Kim, Bong-Ryoul Choi, Donggyu Yim

Proceedings Volume 7140, 71403K (2008) https://doi.org/10.1117/12.804660

KEYWORDS: Critical dimension metrology, Optical proximity correction, Transistors, Semiconducting wafers, Etching, Error analysis, Data modeling, Thermal effects, Databases, Metrology

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Proceedings Article | 21 March 2007 Paper

Highly accurate model-based verification using SEM image calibration method

Byung-ug Cho, Dae-jin Park, Dong-suk Chang, Jae-seung Choi, Cheol-Kyun Kim, DongGyu Yim, Ju-Byung Kim

Proceedings Volume 6521, 65210R (2007) https://doi.org/10.1117/12.712037

KEYWORDS: Scanning electron microscopy, Calibration, Optical proximity correction, Data modeling, Model-based design, Semiconducting wafers, Image processing, Bridges, Manufacturing, Optical lithography

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