Dr. Daniel J. Brown Profile

Dr. Daniel J. Brown

VP Technology & Development at Cymer LLC

SPIE Involvement:

Author

Publications (35)

Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

High-power EUV light sources (>500w) for high throughput in next-generation EUV lithography tools

Klaus Hummler, Qiushi Zhu, Keegan Behm, Liane Matthes, Zhaohan He, Omar Biabani, Andrew LaForge, Bob Rollinger, Dustin Urone, Niek Kleemans, Martin Jurna, Sean McGrogan, Peter Mayer, Michael Purvis, Sander Derks, Alberto Villalta, Abhiram Govindaraju, Yue Ma, Daniel Brown

Proceedings Volume 12953, 129530V (2024) https://doi.org/10.1117/12.3010463

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Carbon monoxide, Light sources, Tin, Semiconducting wafers, Scattering, Scanners, Gas lasers

Read Abstract +

Proceedings Article | 9 September 2019 Presentation

Presentation

Laser-produced plasma incoherent EUV light sources for high-volume manufacturing semiconductor lithography (Conference Presentation)

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Peter Mayer, Klaus Hummler, Martijn Leenders, Yezheng Tao, Slava Rokitski, Jayson Stewart, Alex Ershov, Robert Rafac, Silvia De Dea, Georgiy Vaschenko, David Brandt, Daniel Brown

Proceedings Volume 11111, 111110K (2019) https://doi.org/10.1117/12.2534691

Read Abstract +

Proceedings Article | 3 October 2018 Presentation + Paper

Presentation + Paper

NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W

Igor Fomenkov, Michael Purvis, Alexander Schafgans, Yezheng Tao, Slava Rokitski, Jayson Stewart, Andrew LaForge, Alexander Ershov, Robert Rafac, Silvia De Dea, Chirag Rajyaguru, Georgiy Vaschenko, Mathew Abraham, David Brandt, Daniel Brown

Proceedings Volume 10809, 108091L (2018) https://doi.org/10.1117/12.2502801

KEYWORDS: Extreme ultraviolet, High volume manufacturing

Read Abstract +

Proceedings Article | 10 May 2018 Paper

Paper

Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Mike Vargas, Spencer Rich, Yezheng Tao, Slava Rokitski, Melchior Mulder, Erik Buurman, Michael Kats, Jayson Stewart, Andrew LaForge, Chirag Rajyaguru, Georgiy Vaschenko, Alex Ershov, Robert Rafac, Mathew Abraham, David Brandt, Daniel Brown

Proceedings Volume 10583, 1058327 (2018) https://doi.org/10.1117/12.2305955

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, Tin, High volume manufacturing, Semiconducting wafers, Reflectivity, EUV optics, Photoresist materials

Read Abstract +

Proceedings Article | 5 May 2017 Presentation

Presentation

Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)

Alexander Schafgans, Daniel Brown, Igor Fomenkov, Yezheng Tao, Michael Purvis, Slava Rokitski, Georgiy Vaschenko, Robert Rafac, David Brandt

Proceedings Volume 10143, 101431I (2017) https://doi.org/10.1117/12.2258628

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Lithography, Current controlled current source

Read Abstract +

Proceedings Article | 18 March 2016 Paper

Paper

Advancements in predictive plasma formation modeling

Michael Purvis, Alexander Schafgans, Daniel J. Brown, Igor Fomenkov, Rob Rafac, Josh Brown, Yezheng Tao, Slava Rokitski, Mathew Abraham, Mike Vargas, Spencer Rich, Ted Taylor, David Brandt, Alberto Pirati, Aaron Fisher, Howard Scott, Alice Koniges, David Eder, Scott Wilks, Anthony Link, Steven Langer

Proceedings Volume 9776, 97760K (2016) https://doi.org/10.1117/12.2221991

KEYWORDS: Plasma, Optical simulations, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Carbon dioxide lasers, Performance modeling, Tin, Plasma physics, Optical lithography, Liquids, Laser development, Absorption, Monte Carlo methods, Computer simulations

Read Abstract +

Proceedings Article | 18 March 2016 Paper

Paper

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Martijn van Noordenburg, Roderik van Es, Eric Verhoeven, Henk Meijer, Arthur Minnaert, Jan-Willem van der Horst, Hans Meiling, Joerg Mallmann, Christian Wagner, Judon Stoeldraijer, Geert Fisser, Jo Finders, Carmen Zoldesi, Uwe Stamm, Herman Boom, David Brandt, Daniel Brown, Igor Fomenkov, Michael Purvis

Proceedings Volume 9776, 97760A (2016) https://doi.org/10.1117/12.2220423

KEYWORDS: Extreme ultraviolet, Overlay metrology, Extreme ultraviolet lithography, Manufacturing, Pellicles, Logic devices, Semiconducting wafers, Reticles, Photomasks, Scanners, Fiber optic illuminators, Tin

Read Abstract +

Proceedings Article | 16 March 2015 Paper

Paper

Performance optimization of MOPA pre-pulse LPP light source

Alexander Schafgans, Daniel Brown, Igor Fomenkov, Rick Sandstrom, Alex Ershov, Georgiy Vaschenko, Rob Rafac, Michael Purvis, Slava Rokitski, Yezheng Tao, Daniel Riggs, Wayne Dunstan, Matthew Graham, Nigel Farrar, David Brandt, Norbert Böwering, Alberto Pirati, Noreen Harned, Christian Wagner, Hans Meiling, Ron Kool

Proceedings Volume 9422, 94220B (2015) https://doi.org/10.1117/12.2087421

KEYWORDS: Extreme ultraviolet, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Plasma, Amplifiers, High power lasers, Tin, Laser energy, High volume manufacturing

Read Abstract +

Proceedings Article | 13 March 2015 Paper

Paper

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Arthur W. Minnaert, Martijn van Noordenburg, Jörg Mallmann, Noreen Harned, Judon Stoeldraijer, Christian Wagner, Carmen Zoldesi, Eelco van Setten, Jo Finders, Koen de Peuter, Chris de Ruijter, Milos Popadic, Roger Huang, Martin Lin, Frank Chuang, Roderik van Es, Marcel Beckers, David Brandt, Nigel Farrar, Alex Schafgans, Daniel Brown, Herman Boom, Hans Meiling, Ron Kool

Proceedings Volume 9422, 94221P (2015) https://doi.org/10.1117/12.2085912

KEYWORDS: Semiconducting wafers, Pellicles, Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Imaging systems, Logic, Scanners, Manufacturing, Overlay metrology

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Paper

Laser produced plasma light source development for HVM

Igor Fomenkov, David Brandt, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Norbert Böwering, Daniel Riggs, Robert Rafac, Silvia De Dea, Michael Purvis, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Robert Kazinczi, Alberto Pirati

Proceedings Volume 9048, 904835 (2014) https://doi.org/10.1117/12.2048195

KEYWORDS: Plasma, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Light sources, Deep ultraviolet, Laser development, Hydrogen, Laser applications

Read Abstract +

Proceedings Article | 31 March 2014 Paper

Paper

Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography

R. Burdt, J. Thornes, T. Duffey, T. Bibby, R. Rokitski, E. Mason, J. Melchior, T. Aggarwal, D. Haran, J. Wang, G. Rechtsteiner, M. Haviland, D. Brown

Proceedings Volume 9052, 90522K (2014) https://doi.org/10.1117/12.2048082

KEYWORDS: Light sources, Semiconducting wafers, Lithography, Semiconductors, Scanners, Light, Optical amplifiers, Switching, Optical lithography, Near field optics

Read Abstract +

Proceedings Article | 18 March 2014 Paper

Paper

LPP EUV source readiness for NXE 3300B

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Norbert Böwering, Daniel Riggs, Robert Rafac, Silvia De Dea, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Alberto Pirati, Robert Kazinczi

Proceedings Volume 9048, 90480C (2014) https://doi.org/10.1117/12.2048184

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Control systems, Tin, Reflectivity, Mirrors, Pulsed laser operation, Laser scanners

Read Abstract +

Proceedings Article | 12 April 2013 Paper

Paper

High power 120W ArF immersion XLR laser system for high dose applications

R. Rokitski, R. Rafac, J. Melchior, R. Dubi, J. Thornes, T. Cacouris, M. Haviland, D. Brown

Proceedings Volume 8683, 86831H (2013) https://doi.org/10.1117/12.2012681

KEYWORDS: Light sources, Laser systems engineering, Semiconducting wafers, Optical lithography, Lithography, Time metrology, Deep ultraviolet, Amplifiers, Excimer lasers, Reliability

Read Abstract +

Proceedings Article | 1 April 2013 Paper

Paper

CO2/Sn LPP EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich

Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

Read Abstract +

Proceedings Article | 1 April 2013 Paper

Paper

Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond

Igor Fomenkov, David Brandt, Nigel Farrar, Bruno La Fontaine, Norbert Böwering, Daniel Brown, Alex Ershov, David Myers

Proceedings Volume 8679, 86792I (2013) https://doi.org/10.1117/12.2012695

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Plasma, Light sources, Carbon dioxide lasers, Neodymium, Optical lithography, Laser development, Metrology

Read Abstract +

SPIE Journal Paper | 29 June 2012

Development of stable extreme-ultraviolet sources for use in lithography exposure systems

Igor Fomenkov, Bruno La Fontaine, Daniel Brown, Imtiaz Ahmad, Peter Baumgart, Norbert Bowering, David Brandt, Alexander Bykanov, Silvia De Dea, Alex Ershov, Nigel Farrar, Daniel Golich, Michael Lercel, David Myers, Chirag Rajyaguru, Shailendra Srivastava, Yezheng Tao, Georgiy Vaschenko

JM3, Vol. 11, Issue 02, 021110, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021110

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Paper

Laser produced plasma EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Michael Lercel, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Alexander Bykanov, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christian Wittak, Michael Woolston, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao

Proceedings Volume 8322, 83221I (2012) https://doi.org/10.1117/12.916521

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Mirrors, Coating, Manufacturing, Tin, Semiconducting wafers, Laser scanners

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Paper

Light sources for EUV lithography at the 22-nm node and beyond

Igor Fomenkov, Norbert Böwering, David Brandt, Daniel Brown, Alexander Bykanov, Alex Ershov, Bruno La Fontaine, Michael Lercel, David Myers

Proceedings Volume 8322, 83222N (2012) https://doi.org/10.1117/12.916531

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Ions, Plasma, Carbon dioxide lasers, Light sources, Control systems, Reflectivity, Mirrors

Read Abstract +

Proceedings Article | 8 April 2011 Paper

Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Daniel Brown, Richard Sandstrom, Bruno La Fontaine, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard Hou, Wayne Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, David Brandt

Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Paper

DUV light source availability improvement via further enhancement of gas management technologies

Daniel Riggs, Kevin O'Brien, Daniel J. Brown

Proceedings Volume 7973, 797327 (2011) https://doi.org/10.1117/12.880155

KEYWORDS: Light sources, Halogens, Deep ultraviolet, Fluorine, Lithography, Standards development, Control systems, Systems modeling, Metrology, Algorithm development

Read Abstract +

Proceedings Article | 4 March 2010 Paper

Paper

High reliability ArF light source for double patterning immersion lithography

Rostislav Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Mary Haviland, Theodore Cacouris, Daniel Brown

Proceedings Volume 7640, 76401Q (2010) https://doi.org/10.1117/12.849065

KEYWORDS: Light sources, Double patterning technology, Reliability, Immersion lithography, Electrodes, Lithography, Scanners, Deep ultraviolet, Optical proximity correction, Excimer lasers

Read Abstract +

Proceedings Article | 4 March 2010 Paper

Paper

Lithography light source fault detection

Matthew Graham, Erica Pantel, Patrick Nelissen, Jeffrey Moen, Eduard Tincu, Wayne Dunstan, Daniel Brown

Proceedings Volume 7640, 76402D (2010) https://doi.org/10.1117/12.852758

KEYWORDS: Light sources, Feature extraction, Data analysis, Data modeling, Mathematical modeling, Lithography, Performance modeling, Model-based design, Optical testing, Solids

Read Abstract +

High productivity is a key requirement for today's advanced lithography exposure tools. Achieving targets for wafers per day output requires consistently high throughput and availability. One of the keys to high availability is minimizing unscheduled downtime of the litho cell, including the scanner, track and light source. From the earliest eximer laser light sources, Cymer has collected extensive performance data during operation of the source, and this data has been used to identify the root causes of downtime and failures on the system. Recently, new techniques have been developed for more extensive analysis of this data to characterize the onset of typical end-of-life behavior of components within the light source and allow greater predictive capability for identifying both the type of upcoming service that will be required and when it will be required. The new techniques described in this paper are based on two core elements of Cymer's light source data management architecture. The first is enhanced performance logging features added to newer-generation light source software that captures detailed performance data; and the second is Cymer OnLine (COL) which facilitates collection and transmission of light source data. Extensive analysis of the performance data collected using this architecture has demonstrated that many light source issues exhibit recognizable patterns in their symptoms. These patterns are amenable to automated identification using a Cymer-developed model-based fault detection system, thereby alleviating the need for detailed manual review of all light source performance information. Automated recognition of these patterns also augments our ability to predict the performance trending of light sources. Such automated analysis provides several efficiency improvements for light source troubleshooting by providing more content-rich standardized summaries of light source performance, along with reduced time-to-identification for previously classified faults. Automation provides the ability to generate metrics based on a single light source, or multiple light sources. However, perhaps the most significant advantage is that these recognized patterns are often correlated to known root cause, where known corrective actions can be implemented, and this can therefore minimize the time that the light source needs to be offline for maintenance. In this paper, we will show examples of how this new tool and methodology, through an increased level of automation in analysis, is able to reduce fault identification time, reduce time for root cause determination for previously experienced issues, and enhance our light source performance predictability.

Proceedings Article | 11 December 2009 Paper

Paper

Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

Slava Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Daniel Riggs, Mary Haviland, Theodore Cacouris, Daniel Brown

Proceedings Volume 7520, 752013 (2009) https://doi.org/10.1117/12.839803

KEYWORDS: Light sources, Double patterning technology, Control systems, Scanners, Immersion lithography, Lithography, Deep ultraviolet, Polarization, Optical proximity correction, High volume manufacturing

Read Abstract +

Proceedings Article | 27 May 2009 Paper

Paper

Lithography light source challenges for double patterning and EUVL

Nigel Farrar, Ivan Lalovic, David Brandt, Daniel Brown

Proceedings Volume 7470, 74700D (2009) https://doi.org/10.1117/12.835175

KEYWORDS: Light sources, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Plasma, Double patterning technology, Tin, Lithography, Scanners, Reflectivity

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

Rostislav Rokitski, Vladimir Fleurov, Robert Bergstedt, Hong Ye, Robert Rafac, Robert Jacques, Fedor Trintchouk, Toshihiko Ishihara, Rajasekhar Rao, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 7274, 72743O (2009) https://doi.org/10.1117/12.816049

KEYWORDS: Double patterning technology, Polarization, Laser stabilization, Light sources, Scanners, High volume manufacturing, Immersion lithography, Lithography, Deep ultraviolet, Modulation

Read Abstract +

Deep ultraviolet (DUV) lithography improvements have been focused on two paths: further increases in the effective numerical aperture (NA) beyond 1.3, and double patterning (DP). High-index solutions for increasing the effective NA have not gained significant momentum due to several technical factors, and have been eclipsed by an aggressive push to make DP a high-volume manufacturing solution. The challenge is to develop a cost-effective solution using a process that effectively doubles the lithography steps required for critical layers, while achieving a higher degree of overlay performance. As a result, the light source requirements for DP fall into 3 main categories: (a) higher power to enable higher throughput on the scanner, (b) lower operating costs to offset the increased number of process steps, and (c) high stability of optical parameters to support more stringent process requirements. The XLR 600i (6kHz, 90W @15mJ) was introduced last year to enable DP by leveraging the higher performance and lower operating costs of the ring architecture XLR 500i (6kHz, 60W @10mJ) platform currently used for 45nm immersion lithography in production around the world. In February 2009, the XLR 600ix was introduced as a 60/90W switchable product to provide flexibility in the transition to higher power requirements as scanner capabilities are enhanced. The XLR 600ix includes improved optics materials to meet reliability requirements while operating at higher internal fluences. In this paper we will illustrate the performance characteristics during extended testing. Examples of performance include polarization stability, divergence and pointing stability, which enable consistent pupil fill under extreme illumination conditions, as well as overall thermal stability which maintains constant beam performance under large changes in laser operating modes. Furthermore, the unique beam uniformity characteristics that the ring architecture generates result in lower peak energy densities that are comparable to those of a typical 60W excimer laser. In combination with the XLR's long pulse duration, this allows for long life scanner optics while operating at 15mJ.

Proceedings Article | 16 March 2009 Paper

Paper

Lithography line productivity impact using Cymer GLX technology

Kevin O'Brien, Wayne Dunstan, Robert Jacques, Daniel Brown

Proceedings Volume 7274, 72743N (2009) https://doi.org/10.1117/12.816047

KEYWORDS: Light sources, Lithography, Halogens, Gas lasers, Logic, Semiconducting wafers, Scanners, Laser scanners, 3D scanning, Control systems

Read Abstract +

Leading-edge scanners in fabs worldwide have particularly high system utilization and require peak levels of system throughput and availability. Laser gas exchanges typically occur daily on these systems (or every 100M pulses or less), with each exchange lasting up to 20 minutes. This downtime has a direct negative effect on availability, and if it is reduced, the productivity of the litho cell increases. This paper will outline the immediate success fabs have experienced after equipping scanners with Cymer's Gas Lifetime eXtension (GLX^TM) technology, which increases scanner availability by extending the time between excimer laser gas exchanges by a factor of more than 10. To date, more than 100 leading-edge scanners feature Cymer's GLX technology, which has improved light source availability by more than 1.5 percent. Moreover, multiple chipmakers report more than 2 percent improvement in litho cell productivity due to GLX, corresponding to 2000 wafers/month increase for a 100,000 wafers/month fab. The increase in measured productivity is the leveraged benefit of reducing process interruptions around the refill cycle GLX technology extends the shot-based interval between gas refills to 1 billion pulses for Cymer's XLA light sources, and provides excellent stability in key optical performance parameters, such as bandwidth and dose stability over the entire gas life. This paper will provide extensive performance data during extended light source operation on litho cells equipped with GLX technology, and multiple use scenarios will be examined, including usage at memory and logic fabs. The paper will also discuss the performance of GLX2^TM technology which further extends the maximum time between light source gas exchanges from 1B pulses to 2B pulses, and reduces downtime associated with gas refills by a factor of 20. The stability and productivity benefits of this new technology can be realized under all light source utilization scenarios. With GLX2, the refill interval at high utilization chipmakers is 3 weeks, and 4-8 weeks at lower utilization customers. Metrics illustrating the success of each of these capabilities will be presented. The second-generation of GLX technology was launched in July 2008 after chipmakers responded favorably to GLX performance metrics.

Proceedings Article | 17 March 2008 Paper

Paper

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

Vladimir Fleurov, Slava Rokitski, Robert Bergstedt, Hong Ye, Kevin O’Brien, Robert Jacques, Fedor Trintchouk, Efrain Figueroa, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 6924, 69241R (2008) https://doi.org/10.1117/12.776927

KEYWORDS: Double patterning technology, Light sources, Immersion lithography, Control systems, Scanners, Excimer lasers, Pulsed laser operation, Laser scanners, 3D scanning, Semiconducting wafers

Read Abstract +

Proceedings Article | 7 March 2008 Paper

Paper

Performance demonstration of significant availability improvement in lithography light sources using GLX control system

Kevin O'Brien, Wayne Dunstan, Daniel Riggs, Aravind Ratnam, Robert Jacques, Herve Besaucele, Daniel Brown, Kevin Zhang, Nigel Farrar

Proceedings Volume 6924, 69242Q (2008) https://doi.org/10.1117/12.777209

KEYWORDS: Light sources, Semiconducting wafers, Control systems, Pulsed laser operation, Scanners, Halogens, Lithography, Signal processing, Manufacturing, Semiconductor lasers

Read Abstract +

Proceedings Article | 27 March 2007 Paper

Paper

XLR 500i: recirculating ring ArF light source for immersion lithography

D.J. Brown, P. O'Keeffe, V. Fleurov, R. Rokitski, R. Bergstedt, I. Fomenkov, K. O'Brien, N. Farrar, W. Partlo

Proceedings Volume 6520, 652020 (2007) https://doi.org/10.1117/12.712684

KEYWORDS: Light sources, Molybdenum, Laser stabilization, Optical amplifiers, Critical dimension metrology, Pulsed laser operation, Laser applications, Lithography, Immersion lithography, Oscillators

Read Abstract +

As Argon Fluoride (ArF) lithography moves into high volume production, ArF light sources need to meet performance requirements beyond the traditional drivers of power and bandwidth. The first key requirement is a continuous decrease in Cost of Ownership (CoO) where the industry requirement is for reduction in ArF CoO in line with the historical cost reduction demonstrated for Krypton Fluoride (KrF) light sources. A second requirement is improved light source performance stability. As CD control requirements shrink, following the ITRS roadmap, all process parameters which affect CD variation need tighter control. In the case of the light source, these include improved control of bandwidth, pulse energy stability and wavelength. In particular, CD sensitivity to exposure dose has become a serious challenge for device processing and improvements to laser pulse energy stability can contribute to significantly better dose control. To meet these performance challenges Cymer has designed a new dual chamber laser architecture. The Recirculating Ring design requires 10X less energy from the Master Oscillator (MO). This new configuration enables the MO chamber lifetime to reach that of the power amplifier chamber at around 30Bp. In addition, other optical modules in the system such as the line narrowing module experience lower light intensity, ensuring even longer optics lifetime. Furthermore, the Recirculating Ring configuration operates in much stronger saturation. MO energy instabilities are reduced by a factor of 9X when passed through the Ring. The output energy stability exhibits the characteristics of a fully saturated amplifier and pulse energy stability improvement of 1.5X is realized. This performance enables higher throughput scanner operation with enhanced dose control. The Recirculating Ring technology will be introduced on the XLR 500i, Cymer's fifth-generation dual chamber-based light source built on the production-proven XLA platform. This paper will describe the design details and performance characteristics of the new laser architecture.

Proceedings Article | 26 June 2003 Paper

Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir Fleurov, Daniel Colon, Daniel Brown, Patrick O'Keeffe, Herve Besaucele, Alexander Ershov, Fedor Trintchouk, T. Ishihara, Paolo Zambon, R. Rafac, A. Lukashev

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

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Proceedings Article | 14 September 2001 Paper

Paper

Wavelength stabilization in an excimer laser source using piezoelectric active vibration control

Ronald Spangler, Robert Jacques, Daniel Brown, J. Algots, William Partlo

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435653

KEYWORDS: Ferroelectric materials, Sensors, Excimer lasers, Servomechanisms, Mirrors, Fluctuations and noise, Actuators, Active vibration control, Control systems, Acoustics

Read Abstract +

Proceedings Article | 3 April 2000 Paper

Paper

High-average-power high-beam-quality vis-UV sources based on kinetically enhanced copper vapor lasers

Daniel Brown, Michael Withford, Robert Carman, Richard Mildren, James Piper

Proceedings Volume 3889, (2000) https://doi.org/10.1117/12.380892

KEYWORDS: Plasma, Copper, Copper vapor lasers, Pulsed laser operation, Resonators, Neon, Computer simulations, Halogens, Optical amplifiers, Oscillators

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Proceedings Article | 7 February 2000 Paper

Paper

Optimization of trepanning strategies for micromachining of polymers with high-pulse-rate UV lasers

Elizabeth Illy, Daniel Brown, Michael Withford, James Piper

Proceedings Volume 3888, (2000) https://doi.org/10.1117/12.377071

KEYWORDS: Etching, Polymethylmethacrylate, Polymers, Micromachining, Ultraviolet radiation, Pulsed laser operation, Laser ablation, Copper vapor lasers, Excimer lasers, Ultraviolet sources

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Proceedings Article | 1 February 2000 Paper

Paper

Exploring the explosive ablation regime of metals in nanosecond micromachining

Jennifer Fishburn, Richard Mildren, Daniel Kapitan, Michael Withford, Daniel Brown, James Piper

Proceedings Volume 3885, (2000) https://doi.org/10.1117/12.376996

KEYWORDS: Metals, Laser ablation, Aluminum, Molybdenum, Copper, Titanium, Indium, Tungsten, Explosives, Micromachining

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Proceedings Article | 4 April 1997 Paper

Paper

Performance enhancement of elemental copper vapor lasers by bromine and hydrogenated bromine additives

Robert Carman, Michael Withford, Daniel Brown, James Piper

Proceedings Volume 3092, (1997) https://doi.org/10.1117/12.270156

KEYWORDS: Bromine, Copper, Halogens, Plasma, Copper vapor lasers, Neon, Hydrogen, Pulsed laser operation, Molecules, Ions

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Showing 5 of 35 publications

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