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Process, design rule, and layout co-optimization for DSA based patterning of sub-10nm Finfet devices
Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding
In this paper, we focus on the application of layout decomposition where stitching is not allowed such as for contact and via layers. We propose a linear programming and iterative rounding (LPIR) solving technique to reduce the number of non-integers in the LP relaxation problem. Experimental results show that the proposed algorithms can provide high quality decomposition solutions efficiently while introducing as few conflicts as possible.
Accurate lithography hotspot detection based on PCA-SVM classifier with hierarchical data clustering
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