Deep Panjwani
R & D Photo-Lithography Engineer at Micron Technology
SPIE Involvement:
Author
Area of Expertise:
Lithography , Optics , Sensors , Plasmonics , Nano Particles , Infrared Coatings
Websites:
Profile Summary

Micron Technology is a global leader in manufacturing of DRAM, NAND, NOR Flash memories and now extending its business in consumer products such as SSDs and USB Storage Drives (e.g. Crucial and Ballistix).

– Owning Front End of the Line (FEOL) critical modules for development of next generation NAND FLASH memory at R&D head quarter in Boise (FAB 4).
– Optimize cell yield improvements, failure analysis, and device performance through 365, 248 nm and state of the art immersion lithography techniques.
– Provide Process Integration Solutions & perform Statistical Analysis using Pandas Data Frame on Python. Perform Design of Experiments (DOE) and theoretical simulations (such as Monte Carlo) to predict potential yield in FLASH memory manufacturing. Micron Technology is a global leader in manufacturing of DRAM, NAND, NOR Flash memories and now extending its business in consumer products such as SSDs and USB Storage Drives (e.g. Crucial and Ballistix).

– Owning Front End of the Line (FEOL) critical modules for development of next generation NAND FLASH memory at R&D head quarter in Boise (FAB 4).
– Optimize cell yield improvements, failure analysis, and device performance through 365, 248 nm and state of the art immersion lithography techniques.
– Provide Process Integration Solutions & perform Statistical Analysis using Pandas Data Frame on Python. Perform Design of Experiments (DOE) and theoretical simulations (such as Monte Carlo) to predict potential yield in FLASH memory manufacturing.
Publications (9)

Proceedings Article | 4 September 2015 Paper
Farnood Khalilzade-Rezaie, Robert Peale, Deep Panjwani, Christian Smith, Janardan Nath, Michael Lodge, Masa Ishigami, Nima Nader, Shiva Vangala, Mark Yannuzzi, Justin Cleary
Proceedings Volume 9617, 96170E (2015) https://doi.org/10.1117/12.2188706
KEYWORDS: Oxides, Metals, Graphene, Silicon, Prisms, Molybdenum, Surface plasmon polaritons, Sensors, Transmittance, Capacitors

Proceedings Article | 1 September 2015 Presentation + Paper
Janardan Nath, Deep Panjwani, Farnood Khalilzadeh-Rezaie, Mehmet Yesiltas, Evan Smith, James Ginn, David Shelton, Carol Hirschmugl, Justin Cleary, Robert Peale
Proceedings Volume 9544, 95442M (2015) https://doi.org/10.1117/12.2188198
KEYWORDS: Absorption, Metals, Infrared imaging, Thin films, Metamaterials, Dielectrics, Microscopy, Diffraction, Infrared radiation, Mid-IR

Proceedings Article | 8 June 2015 Paper
Evan Smith, Deep Panjwani, James Ginn, Andrew Warren, Christopher Long, Pedro Figuieredo, Christian Smith, Joshua Perlstein, Nick Walter, Carol Hirschmugl, Robert Peale, David Shelton
Proceedings Volume 9451, 94511I (2015) https://doi.org/10.1117/12.2177401
KEYWORDS: Gold, Bolometers, Sensors, Signal detection, Absorption, Reflectivity, Long wavelength infrared, Coating, Mid-IR, Silica

Proceedings Article | 24 June 2014 Paper
Evan Smith, James Ginn, Andrew Warren, Christopher Long, Deep Panjwani, Robert Peale, David Shelton
Proceedings Volume 9070, 90701Z (2014) https://doi.org/10.1117/12.2050434
KEYWORDS: Sensors, Bolometers, Signal to noise ratio, Resistance, Gold, Vanadium, Modulation, Temperature metrology, Black bodies, Plasma

Proceedings Article | 3 June 2014 Paper
Proceedings Volume 9085, 908507 (2014) https://doi.org/10.1117/12.2050532
KEYWORDS: Refractive index, Silicon, Chalcogenide glass, Thin film coatings, Infrared radiation, Thin films, Chalcogenides, Antireflective coatings, Reflectivity, Glasses

Showing 5 of 9 publications
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