Mr. Dmitry A. Vengertsev Profile

Dmitry A. Vengertsev

Data Scientist, R&D at Micron Technology Inc

Publications (3)

Proceedings Article | 23 October 2015 Paper

New method of detection and classification of yield-impacting EUV mask defects

Ioana Graur, Dmitry Vengertsev, Ananthan Raghunathan, Ian Stobert, Jed Rankin

Proceedings Volume 9635, 96350M (2015) https://doi.org/10.1117/12.2197871

KEYWORDS: Photomasks, Extreme ultraviolet, Scanning electron microscopy, Fermium, Frequency modulation, Image classification, Manufacturing, Image segmentation, Semiconducting wafers, Inspection

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Proceedings Article | 12 April 2013 Paper

The effect of mask and source complexity on source mask optimization

Seung-Hune Yang, Ningning Jia, SeongBo Shim, Dmitry Vengertsev, Jungdal Choi, Ho-Kyu Kang, Young-Chang Kim

Proceedings Volume 8683, 86830C (2013) https://doi.org/10.1117/12.2011993

KEYWORDS: Photomasks, Critical dimension metrology, Source mask optimization, Electron beams, Optical proximity correction, Neodymium, Error analysis, Lithography, Semiconducting wafers, Monte Carlo methods

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Proceedings Article | 8 November 2012 Paper

The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space

Dmitry Vengertsev, Kihyun Kim, Seung-Hune Yang, Seongbo Shim, Seongho Moon, Artem Shamsuarov, Sooryong Lee, Seong-Woon Choi, Jungdal Choi, Ho-Kyu Kang

Proceedings Volume 8522, 85221A (2012) https://doi.org/10.1117/12.953827

KEYWORDS: Optical proximity correction, Calibration, Semiconducting wafers, Data modeling, Statistical modeling, Logic devices, Principal component analysis, Model-based design, Lithography, Optics manufacturing

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