Mr. Dongkwan Lee Profile

Dongkwan Lee

Global Marketing Director at EMD Electronics

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Author

Publications (6)

Proceedings Article | 11 December 2009 Paper

Image reversal trilayer materials and processing

David Abdallah, Kazunori Kurosawa, Elizabeth Wolfer, Victor Monreal, M. Dalil Rahman, DongKwan Lee, Mark Neisser, Ralph Dammel

Proceedings Volume 7520, 75200L (2009) https://doi.org/10.1117/12.837017

KEYWORDS: Etching, Image processing, Photoresist materials, Photomasks, Carbon, Fourier transforms, Lithography, Silicon, Coating, Oxygen

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Proceedings Article | 24 March 2009 Paper

A study on effect of point-of-use filters on defect reduction for advanced 193nm processes

Nelson Vitorino, Elizabeth Wolfer, Yi Cao, DongKwan Lee, Aiwen Wu

Proceedings Volume 7272, 72723M (2009) https://doi.org/10.1117/12.814152

KEYWORDS: Semiconducting wafers, Particles, 193nm lithography, Lithography, Manufacturing, Scanning electron microscopy, Critical dimension metrology, Polymers, Composites, Bottom antireflective coatings

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Proceedings Article | 29 March 2006 Paper

Versatility in lithographic performance of advanced 193 nm contact hole resist

Takanori Kudo, Guanyang Lin, Dongkwan Lee, Dalil Rahman, Allen Timko, Douglas Mckenzie, Clement Anyadiegwu, Simon Chiu, Frank Houlihan, David Rentkiewicz, Ralph Dammel, Munirathna Padmanaban, John Biafore

Proceedings Volume 6153, 61532C (2006) https://doi.org/10.1117/12.659439

KEYWORDS: Polymers, Lithography, Semiconducting wafers, Photomasks, Resolution enhancement technologies, Photoresist processing, Electroluminescence, Critical dimension metrology, Scanning electron microscopy, Etching

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Proceedings Article | 4 May 2005 Paper

Effect of hard bake process on LER

Munirathna Padmanaban, David Rentkiewicz, SangHo Lee, Chisun Hong, Dongkwan Lee, Dalil Rahman, Raj Sakamuri, Ralph Dammel

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.604401

KEYWORDS: Line edge roughness, Photoresist processing, Polymers, Line width roughness, Semiconducting wafers, Critical dimension metrology, Cadmium, Chemically amplified resists, Transistors, Optical lithography

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Proceedings Article | 24 July 2002 Paper

Perflourosulfonyl imides and methides: investigating the lithographic potential of novel superacid PAGs

DongKwan Lee, Xiaoming Ma, William Lamanna, Georg Pawlowski

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474216

KEYWORDS: Photoresist materials, Lithography, Line edge roughness, Polymers, Deep ultraviolet, Manufacturing, Information operations, Standards development, Selenium, Nomenclature

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Proceedings Article | 23 June 2000 Paper

Techniques to print sub-0.2-um contact holes

Kayo Aramaki, T. Hamada, DongKwan Lee, Hiroshi Okazaki, Naoko Tsugama, Georg Pawlowski

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388360

KEYWORDS: Photomasks, Photoresist processing, Binary data, Silicon, Standards development, Photoresist materials, Fourier transforms, Critical dimension metrology, Lithography, Polymers

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Showing 5 of 6 publications

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