Lithography projection objective is one of the most precise optical systems in optical manufacture field. The required accuracy of the asphere in the objective is down to nanometer and sub-nanometer, which is a great challenge for optical fabrication and testing. In this paper, the theories and technologies of sub-nanometer asphere fabrication and testing are studied and developed. Combined the sub-nanometer interference testing method and atom level polishing technologies, sub-nanometer aspheres are realized. Two kinds of testing methods are used for the measurement of the asphere and the difference of the results is less than 1nm (RMS).
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