Dr. Duck-Hyung Hur Profile

Dr. Duck-Hyung Hur

at SAMSUNG Electronics Co Ltd

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Author

Publications (3)

Proceedings Article | 15 March 2012 Paper

Computational lithography work flows and design rule exploration automation

S. Sethi, William Stanton, Kevin Lucas, Jay Hiserote, Duck-Hyung Hur, Rooli Choi

Proceedings Volume 8327, 83270O (2012) https://doi.org/10.1117/12.918057

KEYWORDS: Source mask optimization, Optical proximity correction, Optimization (mathematics), Computational lithography, Resolution enhancement technologies, Atrial fibrillation, Lithography, Computing systems, Manufacturing, Process engineering

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Proceedings Article | 5 April 2011 Paper

Defect-aware reticle floorplanning for EUV masks

Abde Ali Kagalwalla, Puneet Gupta, Duck-Hyung Hur, Chul-Hong Park

Proceedings Volume 7974, 79740Z (2011) https://doi.org/10.1117/12.881667

KEYWORDS: Photomasks, Reticles, Yield improvement, Extreme ultraviolet, Tolerancing, Critical dimension metrology, Algorithms, Dysprosium, Lithography, Semiconducting wafers

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Proceedings Article | 20 March 2006 Paper

Efficient OPC model generation and verification for focus variation

Yong-Hee Park, Yong-Chan Ban, Duck-Hyung Hur, Dong-Hyun Kim, Ji-Suk Hong, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 6154, 61543B (2006) https://doi.org/10.1117/12.656762

KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Lithography, Photomasks, Semiconducting wafers, Optical lithography, Instrument modeling, Critical dimension metrology, Algorithms

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