Dr. Eisuke Ohtomi Profile

Dr. Eisuke Ohtomi

at Western Digital GK

SPIE Involvement:

Author

Publications (3)

SPIE Journal Paper | 13 October 2023

Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness

Eisuke Ohtomi, Vicky Philipsen, Ulrich Welling, Lawrence Melvin, Yosuke Takahata, Yusuke Tanaka, Danilo De Simone

JM3, Vol. 22, Issue 04, 044801, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.044801

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Semiconducting wafers, Nanoimprint lithography, Light sources and illumination, Photoresist processing, Stochastic processes, Extreme ultraviolet, Scanners, Fourier transforms

Read Abstract +

Proceedings Article | 28 April 2023 Paper

Mask absorber/tone and process impact on resist line-edge-roughness

Eisuke Ohtomi, Vicky Philipsen, Joren Severi, Ulrich Welling, Laurence Melvin, Yosuke Takahata, Yusuke Tanaka, Danilo De Simone

Proceedings Volume 12494, 1249410 (2023) https://doi.org/10.1117/12.2657287

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Light sources and illumination, Extreme ultraviolet, Scanners, 3D mask effects, Metal oxides, Optical simulations, Simulations

Read Abstract +

Proceedings Article | 25 May 2022 Presentation + Paper

Resist line edge roughness mitigation at high-NA EUVL

Eisuke Ohtomi, Vicky Phillipsen, Joren Severi, Ulrich Welling, Yusuke Tanaka, Danilo De Simone

Proceedings Volume 12055, 120550K (2022) https://doi.org/10.1117/12.2605822

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Stochastic processes, Scanners, Photoresist materials, Lithography, Semiconducting wafers

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years