Dr. David Liu Profile

Dr. David Liu

Project Manager at INKO Industrial Corp

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Author

Publications (6)

Proceedings Article | 26 March 2013 Paper

Image contrast of line-cut / contact hole features in Complementary E-Beam Lithography (CEBL)

Enden Liu, Cong Tran, David Lam, Ted Prescop

Proceedings Volume 8680, 868023 (2013) https://doi.org/10.1117/12.2011204

KEYWORDS: Polymethylmethacrylate, Electron beam lithography, Software development, Electron beams, Critical dimension metrology, Point spread functions, Monte Carlo methods, Image quality, Scattering, Silicon

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Proceedings Article | 5 April 2012 Paper

Multiple column high-throughput e-beam inspection (EBI)

David Lam, Kevin Monahan, Enden Liu, Cong Tran, Ted Prescop

Proceedings Volume 8324, 83240G (2012) https://doi.org/10.1117/12.927032

KEYWORDS: Inspection, Semiconducting wafers, Defect detection, Wafer inspection, Magnetism, Scanning electron microscopy, Sensors, Scanners, Defect inspection, Data storage

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Proceedings Article | 21 March 2012 Paper

Analysis of multibeam's scalable column for complementary e-beam lithography (CEBL)

Enden Liu, Cong Tran, Ted Prescop, David Lam

Proceedings Volume 8323, 83231X (2012) https://doi.org/10.1117/12.916117

KEYWORDS: Monochromatic aberrations, Beam analyzers, Electron beam lithography, Electron beams, Chromatic aberrations, Semiconducting wafers, Colorimetry, Diffraction, Image resolution, Electrodes

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Proceedings Article | 21 March 2012 Paper

Multiple columns for high-throughput complementary e-beam lithography (CEBL)

Enden Liu, Cong Tran, Ted Prescop, David Lam

Proceedings Volume 8323, 83231Y (2012) https://doi.org/10.1117/12.916118

KEYWORDS: Semiconducting wafers, Electron beam lithography, Polymethylmethacrylate, Lithography, Beam shaping, Optical lithography, Electron beams, Etching, Scanners, Optical alignment

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Proceedings Article | 4 April 2011 Paper

Optimization of e-beam landing energy for EBDW

Enden Liu, Ted Prescop

Proceedings Volume 7970, 79701S (2011) https://doi.org/10.1117/12.879443

KEYWORDS: Electron beam lithography, Semiconducting wafers, Electron beam direct write lithography, Scattering, Chromatic aberrations, Monte Carlo methods, Thermal effects, Laser scattering, Electron beams, Spherical lenses

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Proceedings Article | 4 April 2011 Paper

E-beam to complement optical lithography for 1D layouts

David Lam, Enden Liu, Michael Smayling, Ted Prescop

Proceedings Volume 7970, 797011 (2011) https://doi.org/10.1117/12.879479

KEYWORDS: Electron beam lithography, Lithography, Optical lithography, Semiconducting wafers, Photomasks, Logic, 193nm lithography, Optical alignment, Semiconductors, Metals

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Showing 5 of 6 publications

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