Eric L. Alemy
Product Specialist at EMD Electronics
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474214
KEYWORDS: Photomasks, Polymers, Lithography, Binary data, Diffusion, Scanning electron microscopy, Halftones, Photoresist processing, Coherence (optics), Monochromatic aberrations

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474210
KEYWORDS: Polymers, Lithography, Line edge roughness, Photomasks, Semiconducting wafers, Lithographic illumination, Photoresist processing, Binary data, Fourier transforms, Etching

Proceedings Article | 24 July 2002 Paper
Munirathna Padmanaban, Eric Alemy, Ralph Dammel, Woo-Kyu Kim, Takanori Kudo, Sang-Ho Lee, Douglas McKenzie, Aldo Orsi, Dalil Rahman, Wan-Lin Chen, Reza Sadjadi, William Livesay, Matthew Ross
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474262
KEYWORDS: Etching, Photoresist processing, Scanning electron microscopy, Surface roughness, FT-IR spectroscopy, Electron beams, Semiconducting wafers, Polymers, Chemistry, Oxides

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