During his career, Ernst Galutschek worked in different environments ranging from oceanography and geosciences to fusion research or medical physics - his experience with EUV lithography goes back to 2011. As Project Lead at ASML Research Ernst Galutschek is responsible for developing new solutions to prevent particle contamination in the complex ASML EUV scanner environment. His knowledge on plasma physics, fluid dynamics but also systems engineering are essential skills for coordinating this interdisciplinary effort.