Dr. Fan Wang Profile

Dr. Fan Wang

at Shanghai Micro Electronics Equipment Co Ltd

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Author

Publications (10)

Proceedings Article | 14 July 2015 Paper

Numerical investigation of temperature field Induced by dual wavelength lasers in sub-microsecond laser annealing technology for insulated gate bipolar transistor

GuoDong Cui, Mingying Ma, Fan Wang, Gang Sun, Yanping Lan, Wen Xu

Proceedings Volume 9532, 953223 (2015) https://doi.org/10.1117/12.2186011

KEYWORDS: Annealing, Field effect transistors, Temperature metrology, Pulsed laser operation, Laser applications, Semiconducting wafers, Absorption, Semiconductor lasers, Laser systems engineering, Silicon

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Proceedings Article | 10 April 2013 Paper

Sensitivity improvement by a hybrid scatterometer

Hailiang Lu, Fan Wang, Lifeng Duan, Yonghui Chen

Proceedings Volume 8681, 86811M (2013) https://doi.org/10.1117/12.2011472

KEYWORDS: Colorimetry, Spectroscopy, Scatterometry, Microscopes, Polarization, CCD cameras, Metrology, Optical testing, Optical filters, Critical dimension metrology

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Proceedings Article | 5 April 2012 Paper

Diffraction-based overlay measurement on dedicated mark using rigorous modeling method

Hailiang Lu, Fan Wang, Qingyun Zhang, Yonghui Chen, Chang Zhou

Proceedings Volume 8324, 832422 (2012) https://doi.org/10.1117/12.916365

KEYWORDS: Overlay metrology, Diffraction, Scatterometry, Diffraction gratings, Reflectance spectroscopy, Spectroscopy, Scatter measurement, Semiconducting wafers, Reflectometry, Time metrology

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Proceedings Article | 5 April 2012 Paper

Improving the measurement performance of angle-resolved scattermetry by use of pupil optimization

Fan Wang, Qingyun Zhang, Hailiang Lu, Lifeng Duan, Xiaoping Li

Proceedings Volume 8324, 83242M (2012) https://doi.org/10.1117/12.916115

KEYWORDS: Scatterometry, Monte Carlo methods, Sensors, Critical dimension metrology, Process control, Target detection, Signal processing, Spatial light modulators, Lithography, Image sensors

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Proceedings Article | 20 April 2011 Paper

A study and simulation of the impact of high-order aberrations to overlay error distribution

G. Sun, F. Wang, C. Zhou

Proceedings Volume 7971, 79712K (2011) https://doi.org/10.1117/12.879365

KEYWORDS: Distortion, Overlay metrology, Source mask optimization, Semiconducting wafers, Metrology, Error analysis, Prototyping, Monochromatic aberrations, Image sensors

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Proceedings Article | 20 April 2011 Paper

Multifeature focus exposure matrix for tool diagnosis

Zhiyong Yang, Anatoly Burov, Lifeng Duan, Fan Wang

Proceedings Volume 7971, 79712N (2011) https://doi.org/10.1117/12.879350

KEYWORDS: Semiconducting wafers, Error analysis, Lithography, Critical dimension metrology, Photomasks, Scanners, Diagnostics, Statistical analysis, Data processing, Finite element methods

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Proceedings Article | 11 March 2010 Paper

Aerial image model and application to aberration measurement

Anatoly Bourov, Liang Li, Zhiyong Yang, Fan Wang, Lifeng Duan

Proceedings Volume 7640, 764032 (2010) https://doi.org/10.1117/12.848421

KEYWORDS: Sensors, Wavefronts, Image sensors, Image processing, Process modeling, Photomasks, Lithography, Semiconducting wafers, Image acquisition, Fiber optic illuminators

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Proceedings Article | 10 March 2010 Paper

CDU linear model based on aerial image principal components

Zhiyong Yang, Anatoly Burov, Liang Li, Fan Wang, Zhaoxiang Chu

Proceedings Volume 7640, 764035 (2010) https://doi.org/10.1117/12.848429

KEYWORDS: Process modeling, Wavefronts, Image quality, Lithography, Image processing, Critical dimension metrology, Mirrors, Performance modeling, Inspection, Mathematical modeling

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Proceedings Article | 30 November 2007 Paper

Novel algorithm for modeling aberration-induced overlay in lithographic process

Fan Wang, Mingying Ma, Lifeng Duan, Xiangzhao Wang

Proceedings Volume 6724, 67240O (2007) https://doi.org/10.1117/12.782679

KEYWORDS: Lithography, Monochromatic aberrations, Wavefront aberrations, Zernike polynomials, Spherical lenses, Wavefronts, Computer simulations, Lithographic illumination, Overlay metrology, Reticles

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Proceedings Article | 19 November 2007 Paper

Novel method for measuring axial aberrations of projection optics for lithographic tools

Mingying Ma, Fan Wang, Xiangzhao Wang

Proceedings Volume 6724, 67240N (2007) https://doi.org/10.1117/12.782572

KEYWORDS: Projection systems, Lithography, Semiconducting wafers, Lithographic illumination, Image quality, Optical lithography, Monochromatic aberrations, Finite element methods, Reticles, Critical dimension metrology

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Showing 5 of 10 publications

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