Dr. Florian H. Käfer Profile

Dr. Florian H. Käfer

at Cornell Univ

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 22 November 2023 Presentation

Sequence-defined polypeptoids as DUV and EUV chemically amplified resists

Cameron Adams, Xiangxi Meng, Florian Kaefer, Chenyun Yuan, Christopher Ober, Rachel Segalman

Proceedings Volume PC12750, PC127500J (2023) https://doi.org/10.1117/12.2688477

KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Chemically amplified resists, Extreme ultraviolet lithography, Polymers, Optical lithography, Chemical composition, Switches, Stochastic processes, Solubility

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Proceedings Article | 1 May 2023 Presentation + Paper

Photoresists with precisely controlled molecular weight, composition, and sequence

Florian Kaefer, Zoey Meng, Rachel Segalman, Javier Read de Alaniz, Christopher Ober

Proceedings Volume 12498, 124980F (2023) https://doi.org/10.1117/12.2658582

KEYWORDS: Photoresist materials, Polymers, Stochastic processes, Solubility, Chemical composition, Lithography, Polymerization, Nitrogen, Extreme ultraviolet lithography

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Proceedings Article | 1 May 2023 Presentation + Paper

Sequence-defined polypeptoid CARs for electron-beam and EUV lithography

Florian Kaefer, Christopher Ober, Zoey Meng, Rachel Segalman, Javier Read de Alaniz

Proceedings Volume 12498, 1249817 (2023) https://doi.org/10.1117/12.2658413

KEYWORDS: Lithography, Extreme ultraviolet lithography, Solubility, Polymers, Solids, Photoacid generators, Extreme ultraviolet, Electron beam lithography, Chemical composition, Switching

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Proceedings Article | 1 December 2022 Poster + Paper

Controlled sequence peptoids as photoresist platforms for high-resolution DUV/EUV photoresists

X. Zoey Meng, Florian Käfer, Gregory Wallraff, Christopher Ober, Rachel Segalman

Proceedings Volume 12292, 122920Q (2022) https://doi.org/10.1117/12.2642965

KEYWORDS: Polymers, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Deep ultraviolet, Switches, Standards development, Polymer thin films

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SPIE Journal Paper | 31 March 2022 Open Access

Review of essential use of fluorochemicals in lithographic patterning and semiconductor processing

Christopher Ober, Florian Kafer, Jingyuan Deng

JM3, Vol. 21, Issue 01, 010901, (March 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.010901

KEYWORDS: Photoresist materials, Fluorine, Optical lithography, Lithography, Polymers, Semiconductor manufacturing, Semiconductors, Refractive index, Antireflective coatings, Dielectrics

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