Characteristic matrix method was applied to study the anomalous Quartz-Crystal-Microbalance (QCM) data such as
sequential peaks of resonance frequency and impedance. The formation of swelling layer was found to cause the broad
peak of resonance frequency at the beginning of development. An impedance peak followed the frequency peak when
the rigidity of the swelling layer decreased to ca. 105 Pa due to absorption of the developer. Constant thickness of a
swelling layer makes double sets of sequential peaks in frequency and impedance. Continuous changes in swelling layer
thickness caused a single set of peaks during development. A fast data-acquisition system for QCM was set up and
showed the sampling time of 1 kHz with the accuracy of 0.5 nm. It gives good and precise information for resist of large
dissolution rate and interface region between resist and substrate.
In recent years, ArF lithography has required a half-pitch size (DRAM) of 45 nm or less. To achieve the
requirement, line edge roughness (LER) is recognized as one of the most serious problems in lithography today,
because LER directly degrades device characteristics and affects system performances. Although the uniformity of
polymer film is important for reducing LER, little is known about polymer morphology after coating. In this study, we
observed the surface of poly(methacrylate) samples after coating with AFM tapping mode and found specific
morphology in the phase images for the first time (the height image was flat).
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