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Gaby Bélot
at STMicroelectronics (Grenoble 2) SAS
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Author
Publications (3)
Proceedings Article | 26 August 2024 Paper
Rethinking mask strategies for high vertical resolution grayscale lithography
Gaby Bélot, Aurélien Fay, Elodie Sungauer, Ujwol Palanchoke, Sébastien Bérard-Bergery, Cécile Gourgon
Proceedings Volume 13177, 131770D (2024) https://doi.org/10.1117/12.3032088
KEYWORDS: Design, 3D mask effects, Chromium, Data modeling, Photoresist materials, Tunable filters, Optical lithography, Electron beam lithography, Modulation, Grayscale lithography
Proceedings Article | 10 April 2024 Poster
Impact of process parameters on grayscale MEEF
Ujwol Palanchoke, Florian Tomaso, Yorrick Exbrayat, Gaby Bélot, Marie-Line Pourteau, Ivanie Mendes, Juline Saugnier, Aurélien Fay, Sébastien Bérard-Bergery, Elodie Sungauer, Charlotte Beylier, Rémi Coquand, Arthur Bernadac
Proceedings Volume PC12956, PC129560Y (2024) https://doi.org/10.1117/12.3010850
KEYWORDS: 3D mask effects, Grayscale lithography, 3D modeling, Data modeling, 3D microstructuring, 3D acquisition, Semiconductors, Profilometers, Process control, Photoresist processing
Proceedings Article | 1 May 2023 Presentation + Paper
Mask errors impact on grayscale lithography patterning
Ujwol Palanchoke, Gaby Bélot, Sébastien Bérard-Bergery, Juline Saugnier, Elodie Sungauer, Charlotte Beylier, Florian Tomaso, Marie-Line Pourteau, Ivanie Mendes, Rémi Coquand, Arthur Bernadac
Proceedings Volume 12497, 124970N (2023) https://doi.org/10.1117/12.2657600
KEYWORDS: Critical dimension metrology, 3D mask effects, Microlens, Design and modelling, Cadmium, Scanning electron microscopy, Semiconducting wafers, Error analysis, 3D acquisition, Grayscale lithography
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