Dr. Gary A. Allen Profile

Dr. Gary A. Allen

Staff Engineer at Intel Corp

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Publications (6)

Proceedings Article | 7 March 2008 Paper

Coupled eigenmode theory applied to thick mask modeling of TM polarized imaging

Gary Allen, Paul Davids

Proceedings Volume 6924, 69244Z (2008) https://doi.org/10.1117/12.775520

KEYWORDS: Magnetism, Reticles, Modulation transfer functions, Diffraction, Binary data, Polarization, Diffraction gratings, Refraction, 3D modeling, Maxwell's equations

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Proceedings Article | 30 October 2007 Paper

The MEEF NILS divergence for low k1 lithography

Richard Schenker, Wen-hao Cheng, Gary Allen

Proceedings Volume 6730, 67301M (2007) https://doi.org/10.1117/12.742273

KEYWORDS: Photomasks, Semiconducting wafers, Chromium, Silica, Binary data, Printing, Optical lithography, Finite-difference time-domain method, Diffusion, Glasses

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Proceedings Article | 15 May 2007 Paper

Coupled eigenmode theory applied to thick mask modeling

Gary Allen, Paul Davids

Proceedings Volume 6607, 660730 (2007) https://doi.org/10.1117/12.729019

KEYWORDS: Binary data, Diffraction, Reticles, Diffraction gratings, Signal attenuation, Scattering, Modulation transfer functions, Photomasks, Mass attenuation coefficient, Coherence imaging

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Proceedings Article | 20 March 2006 Paper

Simulation of dense contact hole (κ₁=0.35) arrays with 193 nm immersion lithography

Alex Raub, Abani Biswas, Y. Borodovsky, G. Allen, S. Brueck

Proceedings Volume 6154, 61542U (2006) https://doi.org/10.1117/12.656694

KEYWORDS: Polarization, Photomasks, Optical proximity correction, Lithographic illumination, Imaging arrays, Lithography, Spatial frequencies, Printing, Interferometry, Optical lithography

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Proceedings Article | 26 June 2003 Paper

Alternating phase-shift masks for contact patterning

Richard Schenker, Gary Allen, Edita Tejnil, Shem Ogadhoh

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485495

KEYWORDS: Photomasks, Optical lithography, Inspection, Glasses, Semiconducting wafers, Phase shifts, Defect inspection, Defect detection, Manufacturing, Deep ultraviolet

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Proceedings Article | 1 August 2002 Paper

Lithography strategy for 65-nm node

Yan Borodovsky, Richard Schenker, Gary Allen, Edita Tejnil, David Hwang, Fu-Chang Lo, Vivek Singh, Robert Gleason, Joseph Brandenburg, Robert Bigwood

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476916

KEYWORDS: Optical lithography, Photomasks, Optical proximity correction, Manufacturing, Inspection, Lithography, 193nm lithography, Phase shifts, Mask making, Semiconducting wafers

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Showing 5 of 6 publications

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