Mr. Gary Dabbagh Profile

Gary Dabbagh

Staff Applications Engineer at JSR Micro Inc

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Author

Publications (14)

Proceedings Article | 16 April 2011 Paper

Implementation of KrF DBARCs for implant applications on advanced lithography nodes

Joyce Lowes, Alice Guerrero, Michael Weigand, Carlton Washburn, Charlyn Stroud, Shalini Sharma, David Torres, Mark Slezak, Gary Dabbagh, Cherry Tang

Proceedings Volume 7972, 797227 (2011) https://doi.org/10.1117/12.879464

KEYWORDS: Picosecond phenomena, Photoresist materials, Lithography, Semiconducting wafers, Critical dimension metrology, Photoresist developing, Polymers, Silicon, Reflectivity, Photomasks

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Proceedings Article | 26 March 2010 Paper

Process characterization of pitch-split resist materials for application at 16nm node

Steven Holmes, Cherry Tang, John Arnold, Yunpeng Yin, Rex Chen, Nicolette Fender, Brian Osborn, Gary Dabbagh, Sen Liu, Matthew Colburn, Rao Varanasi, Mark Slezak

Proceedings Volume 7639, 76392X (2010) https://doi.org/10.1117/12.846891

KEYWORDS: Lithography, Photoresist processing, Semiconducting wafers, Double patterning technology, Semiconductors, Photomasks, Reactive ion etching, Silicon, Scanning electron microscopy, Particles

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Proceedings Article | 9 April 2007 Paper

Building an immersion topcoat from the ground up: materials perspective

Mahmoud Khojasteh, Irene Popova, P. Rao Varanasi, Linda Sundberg, C. Robinson, D. Corliss, Margaret Lawson, G. Dabbagh, M. Slezak, Matthew Colburn, K. Petrillo

Proceedings Volume 6519, 651907 (2007) https://doi.org/10.1117/12.712095

KEYWORDS: Thin film coatings, Polymers, Polymer thin films, Lithography, Immersion lithography, Solids, Photoresist processing, Scanners, Scanning electron microscopy, Statistical analysis

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Proceedings Article | 23 March 2007 Paper

High-performance 193-nm photoresists based on fluorosulfonamide

Wenjie Li, Kuang-Jung Chen, Ranee Kwong, Margaret Lawson, Mahmoud Khojasteh, Irene Popova, P. Rao Varanasi, Tsutomu Shimokawa, Yoshikazu Yamaguchi, Shiro Kusumoto, Makoto Sugiura, Takanori Kawakami, Mark Slezak, Gary Dabbagh, Zhi Liu

Proceedings Volume 6519, 65190F (2007) https://doi.org/10.1117/12.712231

KEYWORDS: Polymers, Etching, Fluorine, Resistance, Lithography, Immersion lithography, 193nm lithography, Chemical species, Photoresist materials, Lithographic illumination

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Proceedings Article | 4 May 2005 Paper

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Pushkara Varanasi, Ranee Kwong, Mahmoud Khojasteh, Kaushal Patel, Kuang-Jung Chen, Wenjie Li, M. Lawson, Robert Allen, Ratnam Sooriyakumaran, P. Brock, Linda Sundberg, Mark Slezak, Gary Dabbagh, Z. Liu, Yukio Nishimura, Takashi Chiba, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599700

KEYWORDS: Polymers, 193nm lithography, Lithography, Etching, Photoresist materials, Fluorine, Immersion lithography, Modulation, Photomasks, Reactive ion etching

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Proceedings Article | 4 May 2005 Paper

Progress toward developing high performance immersion compatible materials and processes

Karen Petrillo, Kaushal Patel, Rex Chen, Wenjie Li, Ranee Kwong, Peggy Lawson, Rao Varanasi, Chris Robinson, Steven Holmes, Dario Gil, Kurt Kimmel, Mark Slezak, Gary Dabbagh, Takashi Chiba, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601621

KEYWORDS: Polymers, Lithography, Immersion lithography, Materials processing, Semiconducting wafers, Particles, Photoresist materials, Image processing, Photoresist processing, Scanners

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Proceedings Article | 24 July 2002 Paper

Fluorinated dissolution inhibitors for 157-nm lithography

Alyssandrea Hamad, Young Bae, Xiang-Qian Liu, Christopher Ober, Francis Houlihan, Gary Dabbagh, Anthony Novembre

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474245

KEYWORDS: Polymers, FT-IR spectroscopy, Absorbance, Photoresist materials, Lithography, Polymethylmethacrylate, Polymer thin films, Distributed interactive simulations, Absorption, Silicon

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Proceedings Article | 24 August 2001 Paper

Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Francis Houlihan, Zhenglin Yan, Elsa Reichmanis, Gary Dabbagh, Kevin Bolan, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436904

KEYWORDS: Lithography, Polymers, Molecules, Solids, Semiconducting wafers, Image resolution, Silicon films, Prototyping, Chemically amplified resists, Analog electronics

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Proceedings Article | 23 June 2000 Paper

Modeling chemically amplified resists for 193-nm lithography

Ebo Croffie, Mosong Cheng, Andrew Neureuther, Francis Houlihan, Raymond Cirelli, James Sweeney, Gary Dabbagh, Pat Watson, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov, Allen Gabor

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388300

KEYWORDS: Diffusion, Data modeling, FT-IR spectroscopy, Chemically amplified resists, Semiconducting wafers, Absorbance, Photolysis, Polymers, Lithography, Interfaces

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Proceedings Article | 23 June 2000 Paper

Model study by FT-IR and 13C NMR of the interaction of poly(norbornene-alt-maleic anhydride) and its derivatives with select cholate dissolution inhibitors or with select iodonium and sulfonium phot

Gary Dabbagh, Francis Houlihan, Ilya Rushkin, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Zhenglin Yan, Arnost Reiser

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388265

KEYWORDS: Distributed interactive simulations, Clouds, Polymers, Hydrogen, FT-IR spectroscopy, Spectroscopy, Medium wave, Photoresist materials, Bismuth, Silver

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Proceedings Article | 23 June 2000 Paper

Mechanism of single-layer 193-nm dissolution inhibition resist

Zhenglin Yan, Francis Houlihan, Elsa Reichmanis, Omkaram Nalamasu, Arnost Reiser, Gary Dabbagh, Richard Hutton, Dan Osei, Jose Sousa, Kevin Bolan

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388275

KEYWORDS: Ions, Polymers, Clouds, Polymer thin films, Switches, Medium wave, Molecules, Imaging systems, Spectroscopy, Hydrogen

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Proceedings Article | 11 June 1999 Paper

Model study by FT-IR of the interaction of select cholate dissolution inhibitors with poly(norbornene-alt-maleic anhydride) and its derivatives

Gary Dabbagh, Francis Houlihan, Ilya Rushkin, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Allen Gabor, Arturo Medina

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350155

KEYWORDS: Polymers, Hydrogen, FT-IR spectroscopy, Absorption, Molecules, Molecular interactions, Spectroscopy, Polymer thin films, Fourier spectroscopy, Lithography

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Proceedings Article | 11 June 1999 Paper

Optimization of 193-nm single-layer resists through statistical design

Allen Gabor, Ognian Dimov, Arturo Medina, Mark Neisser, Sydney Slater, Ruey Wang, Francis Houlihan, Raymond Cirelli, Gary Dabbagh, Richard Hutton, Ilya Rushkin, James Sweeney, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350205

KEYWORDS: Polymers, Lithography, Binary data, Distributed interactive simulations, Etching, Resistance, Photomasks, Diffusion, Silicon, Semiconducting wafers

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Proceedings Article | 29 June 1998 Paper

Positive-tone processing of plasma-polymerized methylsilane (PPMS)

Gary Dabbagh, Richard Hutton, Raymond Cirelli, Elsa Reichmanis, Anthony Novembre, Omkaram Nalamasu

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312398

KEYWORDS: Oxygen, Plasma, Etching, Polymers, Plasma etching, Image processing, Diffusion, Lithography, Infrared spectroscopy, Refractive index

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Showing 5 of 14 publications

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