Prof. George C. Johnson Profile

Prof. George C. Johnson

at Univ of California Berkeley

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 12 April 2005 Paper

A new method to measure the distance between the micro-device and the substrate

Satoshi Kishimoto, George Johnson

Proceedings Volume 5852, (2005) https://doi.org/10.1117/12.621892

KEYWORDS: Distance measurement, Scanning electron microscopy, Sensors, Electron beams, Electron microscopes, Microelectromechanical systems, Experimental mechanics, Objectives, Materials science, Mechanical engineering

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Proceedings Article | 23 December 2003 Paper

MEMS process error characterization using lateral resonant structures

George Johnson, A. Miller Allen

Proceedings Volume 5343, (2003) https://doi.org/10.1117/12.524236

KEYWORDS: Microelectromechanical systems, Error analysis, Etching, Algorithm development, Scanning electron microscopy, Detection and tracking algorithms, Silicon, Metrology, Photomicroscopy, Structural design

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Proceedings Article | 30 August 1999 Paper

Materials characterization for MEMS: a comparison of uniaxial and bending tests

George Johnson, Peter Jones, Roger Howe

Proceedings Volume 3874, (1999) https://doi.org/10.1117/12.361209

KEYWORDS: Microelectromechanical systems, Failure analysis, Material characterization, Metrology, Sensors, Actuators, Silicon, Error analysis, Computer engineering, Computer science

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Proceedings Article | 18 August 1999 Paper

Statistical characterization of fracture of brittle MEMS materials

Peter Jones, George Johnson, Roger Howe

Proceedings Volume 3880, (1999) https://doi.org/10.1117/12.359368

KEYWORDS: Failure analysis, Microelectromechanical systems, Beam shaping, Video, Scanning electron microscopy, Image processing, Silicon, Analytical research, Sensors, Actuators

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SPIE Journal Paper | 1 August 1997

New method for the measurement of surface variations using a microdevice and a scanning electron microscope

Satoshi Kishimoto, George Johnson

OE, Vol. 36, Issue 08, (August 1997) https://doi.org/10.1117/12.10.1117/1.601459

KEYWORDS: Scanning electron microscopy, Sensors, Electron microscopes, Electron beams, Computing systems, Micromachining, Optical engineering, Contamination, Image processing, Distance measurement

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